Inventor · disambiguated record
Chawon Koh
Also filed as: KOH CHAWON
9 granted patents·13 pending applications·3 citations·filing 2013–2024
76Inventor score
Top patents by PatentIndex Score
22 records- 0179US11327398B2Photoresist compositions and methods for fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 10, 2022·2 cites·20 claims
- 0269US11599021B2Photoresist compositions and methods for fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 7, 2023·0 cites·8 claims
- 0362US2024255845A1Photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0462US2024142874A1Non-chemically amplified resist composition and method of manufacturing integrated circuit device by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0562US2025231479A1Photoresist composition and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0662US2024210832A1Photoresist topcoat composition, and method of forming patterns using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0761US2025197782A1Rinse material composition for patterning process using lithography and patterning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0860US12360451B2Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 15, 2025·0 cites·20 claims
- 0960US10353290B2Photoresist composition for extreme ultraviolet and method of forming photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 16, 2019·1 cites·12 claims
- 1056US2025199399A1Photoresist compositions and methods of manufacturing integrated circuit devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1155US2023314956A1Substrate processing methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1255US2023400764A1Organometallic compound comprising a metal combined with at least one ligand containing four or more fluorine atoms, resist composition comprising the same, and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1353US9158204B2Photo lithographic rinse solution and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Oct 13, 2015·0 cites·16 claims
- 1453US2023076633A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1549US2025093772A1Photoresist compositions and methods of forming patterns using a photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1649US2021380612A1Photoresist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2021·Application pending·0 cites
- 1748US11189503B2Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying systemSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 30, 2021·0 cites·17 claims
- 1848US2024255848A1Semiconductor photoresist composition and method of forming patterns using the compositionLEE GEUN SU·Filed 2023·Application pending·0 cites
- 1946US11923209B2Substrate processing apparatus and substrate processing methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 2045US2016026090A1Method of manufacturing a semiconductor device using photolithographic rinse solutionSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
- 2144US12112948B2Method of manufacturing integrated circuit device using a metal-containing photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 8, 2024·0 cites·12 claims
- 2238US9564325B2Methods of fabricating a semiconductor deviceKOH CHAWON·Filed 2014·Granted Feb 7, 2017·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →