Inventor · disambiguated record
Fumitoshi Sugimoto
Also filed as: SUGIMOTO FUMITOSHI
9 granted patents·1 pending application·223 citations·filing 1990–2015
87Inventor score
Top patents by PatentIndex Score
10 records- 0195US5562529AApparatus and method for uniformly polishing a waferFUJITSU LTD·Filed 1993·Granted Oct 8, 1996·119 cites·6 claims
- 0282US5413951AComposite semiconductor substrate and a fabrication process thereofFUJITSU LTD·Filed 1993·Granted May 9, 1995·73 cites·19 claims
- 0367US7887977B2Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and SRAM manufacture methodFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Feb 15, 2011·2 cites·16 claims
- 0460US9148167B2Capacitor array, AD converter and semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2015·Granted Sep 29, 2015·1 cites·20 claims
- 0550US5506433AComposite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereonFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·17 cites·16 claims
- 0644US7820364B2Semiconductor device manufacturing method, mask manufacturing method, and exposure methodFUJITSU SEMICONDUCTOR LTD·Filed 2006·Granted Oct 26, 2010·0 cites·10 claims
- 0744US7678693B2Exposure method for upper layer of hole of semiconductor deviceFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Mar 16, 2010·0 cites·26 claims
- 0842US7741016B2Method for fabricating semiconductor device and exposure maskFUJITSU SEMICONDUCTOR LTD·Filed 2006·Granted Jun 22, 2010·0 cites·7 claims
- 0940US5017998ASemiconductor device using SOI substrateFUJITSU LTD·Filed 1990·Granted May 21, 1991·11 cites·10 claims
- 1038US2006003235A1Semiconductor manufacturing method and an exposure maskFUJITSU LTD·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →