Inventor · disambiguated record
Mcdonald Robinson
Also filed as: ROBINSON MCDONALD
30 granted patents·1 pending application·3,206 citations·filing 1982–2003
98Inventor score
Files withEPSILON TECHN INC8ADVANCED SEMICONDUCTOR MAT5AT & T BELL LAB5EPSILON LP2LAWRENCE SEMICONDUCTOR RESEARC2
Top patents by PatentIndex Score
31 records- 0199US5221556AGas injectors for reaction chambers in CVD systemsEPSILON TECHN INC·Filed 1987·Granted Jun 22, 1993·755 cites·9 claims
- 0298US4828224AChemical vapor deposition systemEPSILON TECHN INC·Filed 1987·Granted May 9, 1989·557 cites·2 claims
- 0397US4836138AHeating system for reaction chamber of chemical vapor deposition equipmentEPSILON TECHN INC·Filed 1987·Granted Jun 6, 1989·166 cites·37 claims
- 0495US5906708ASilicon-germanium-carbon compositions in selective etch processesLAWRENCE SEMICONDUCTOR RESEARC·Filed 1995·Granted May 25, 1999·172 cites·9 claims
- 0595US4497683AProcess for producing dielectrically isolated silicon devicesAT & T BELL LAB·Filed 1982·Granted Feb 5, 1985·119 cites·6 claims
- 0694US4975561AHeating system for substratesEPSILON TECHN INC·Filed 1989·Granted Dec 4, 1990·98 cites·34 claims
- 0794US4789771AMethod and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatusEPSILON LP·Filed 1987·Granted Dec 6, 1988·110 cites·20 claims
- 0893US6064081ASilicon-germanium-carbon compositions and processes thereofLAWRENCE SEMICONDUCTOR RESEARC·Filed 1998·Granted May 16, 2000·159 cites·6 claims
- 0993US5080549AWafer handling system with Bernoulli pick-upEPSILON TECHN INC·Filed 1990·Granted Jan 14, 1992·170 cites·14 claims
- 1093US5020475ASubstrate handling and transporting apparatusEPSILON TECHN INC·Filed 1989·Granted Jun 4, 1991·64 cites·40 claims
- 1191US4616247AP-I-N and avalanche photodiodesAT & T BELL LAB·Filed 1983·Granted Oct 7, 1986·73 cites·15 claims
- 1290US5092728ASubstrate loading apparatus for a CVD processEPSILON TECHN INC·Filed 1989·Granted Mar 3, 1992·51 cites·7 claims
- 1389US5525157AGas injectors for reaction chambers in CVD systemsADVANCED SEMICONDUCTOR MAT·Filed 1995·Granted Jun 11, 1996·48 cites·7 claims
- 1489US5324155AWafer handling system with bernoulli pick-upADVANCED SEMICONDUCTOR MAT·Filed 1992·Granted Jun 28, 1994·105 cites·15 claims
- 1589US4798165AApparatus for chemical vapor deposition using an axially symmetric gas flowEPSILON·Filed 1988·Granted Jan 17, 1989·87 cites·11 claims
- 1688US5411590AGas injectors for reaction chambers in CVD systemsADVANCED SEMICONDUCTOR MAT·Filed 1991·Granted May 2, 1995·47 cites·14 claims
- 1787US5435682AChemical vapor desposition systemADVANCED SEMICONDUCTOR MAT·Filed 1994·Granted Jul 25, 1995·74 cites·10 claims
- 1887US4654509AMethod and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatusEPSILON LTD PARTNERSHIP·Filed 1985·Granted Mar 31, 1987·58 cites·4 claims
- 1985US5961877AWet chemical etchantsFiled 1995·Granted Oct 5, 1999·60 cites·7 claims
- 2085US4874464AProcess for epitaxial deposition of siliconEPSILON LP·Filed 1988·Granted Oct 17, 1989·36 cites·21 claims
- 2180US5458918AGas injectors for reaction chambers in CVD systemsADVANCED SEMICONDUCTOR MAT·Filed 1993·Granted Oct 17, 1995·30 cites·11 claims
- 2278US5156521AMethod for loading a substrate into a GVD apparatusEPSILON TECHN INC·Filed 1991·Granted Oct 20, 1992·30 cites·13 claims
- 2377US5819684AGas injection system for reaction chambers in CVD systemsFiled 1996·Granted Oct 13, 1998·22 cites·5 claims
- 2472US5071830AMetalorganic deposition method for forming epitaxial thallium-based copper oxide superconducting filmsSUPERCONDUCTOR TECH·Filed 1988·Granted Dec 10, 1991·17 cites·10 claims
- 2566US4461670AProcess for producing silicon devicesAT & T BELL LAB·Filed 1982·Granted Jul 24, 1984·28 cites·9 claims
- 2663US6770504B2Methods and structure for improving wafer bow controlHONEYWELL INT INC·Filed 2003·Granted Aug 3, 2004·11 cites·10 claims
- 2763US4494303AMethod of making dielectrically isolated silicon devicesAT & T BELL LAB·Filed 1983·Granted Jan 22, 1985·24 cites·9 claims
- 2860US7232487B2Method for making an epitaxial germanium temperature sensorSMITHSONIAN ASTROPHYSICAL OBSE·Filed 2001·Granted Jun 19, 2007·12 cites·11 claims
- 2952US4571818AIsolation process for high-voltage semiconductor devicesAT & T BELL LAB·Filed 1983·Granted Feb 25, 1986·15 cites·13 claims
- 3046US5358926AEpitaxial thin superconducting thallium-based copper oxide layersSUPERCONDUCTOR TECH·Filed 1993·Granted Oct 25, 1994·8 cites·15 claims
- 3138US2002081861A1Silicon-germanium-carbon compositions and processes thereofFiled 2001·Application pending·0 cites
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