Inventor · disambiguated record
Vladimir Dmitriev
Also filed as: DMITRIEV VLADIMIR · DMITRIEV VLADIMIR J
21 granted patents·3 pending applications·68 citations·filing 2002–2025
92Inventor score
Top patents by PatentIndex Score
24 records- 0193US9658527B2Correction of errors of a photolithographic mask using a joint optimization processDMITRIEV VLADIMIR·Filed 2011·Granted May 23, 2017·14 cites·25 claims
- 0292US10061192B2Method and apparatus for correcting errors on a wafer processed by a photolithographic maskZEISS CARL SMT GMBH·Filed 2016·Granted Aug 28, 2018·6 cites·23 claims
- 0387US9436080B2Method and apparatus for correcting errors on a wafer processed by a photolithographic maskBEYER DIRK·Filed 2011·Granted Sep 6, 2016·9 cites·19 claims
- 0479US10353295B2Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a waferZEISS CARL SMS LTD·Filed 2016·Granted Jul 16, 2019·3 cites·58 claims
- 0577US8421026B2Method and apparatus for mapping of line-width size distributions on photomasksBEN-ZVI GUY·Filed 2009·Granted Apr 16, 2013·6 cites·36 claims
- 0676US11366382B2Method and apparatus for performing an aerial image simulation of a photolithographic maskZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·21 claims
- 0776US9753366B2Method and apparatus for the determination of laser correcting tool parametersDMITRIEV VLADIMIR·Filed 2011·Granted Sep 5, 2017·4 cites·12 claims
- 0871US8871409B2Lithographic targets for uniformity controlPFORR RAINER·Filed 2011·Granted Oct 28, 2014·3 cites·48 claims
- 0971US7459242B2Method and system for repairing defected photomasksPIXER TECHNOLOGY LTD·Filed 2002·Granted Dec 2, 2008·15 cites·9 claims
- 1069US9207530B2Analyses of measurement dataDMITRIEV VLADIMIR·Filed 2011·Granted Dec 8, 2015·2 cites·46 claims
- 1167US2025369899A1Mask metrology measuring device and method for examining a photomaskZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1264US9034539B2Controllable transmission and phase compensation of transparent materialOSHEMKOV SERGEY·Filed 2011·Granted May 19, 2015·2 cites·26 claims
- 1362US9134112B2Critical dimension uniformity correction by scanner signature controlSHARONI OFIR·Filed 2011·Granted Sep 15, 2015·2 cites·25 claims
- 1462US2023408911A1Method and apparatus for optimizing a defect correction for an optical element used in a lithographic processZEISS CARL SMS LTD·Filed 2023·Application pending·0 cites
- 1561US2024280892A1Method for correcting errors in photolithographic masks while avoiding damage to rear-side coatingsZEISS CARL SMS LTD·Filed 2024·Application pending·0 cites
- 1660US9606444B2Method and apparatus for locally deforming an optical element for photolithographyDMITRIEV VLADIMIR·Filed 2012·Granted Mar 28, 2017·1 cites·22 claims
- 1753US9798249B2Method and apparatus for compensating at least one defect of an optical systemZEISS CARL SMS LTD·Filed 2014·Granted Oct 24, 2017·0 cites·20 claims
- 1852US10114294B2Apparatus and method for imparting direction-selective light attenuationZEISS CARL SMS LTD·Filed 2017·Granted Oct 30, 2018·0 cites·36 claims
- 1950US11914289B2Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic maskZEISS CARL SMS LTD·Filed 2021·Granted Feb 27, 2024·0 cites·19 claims
- 2045US11366383B2Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic maskZEISS CARL SMS LTD·Filed 2019·Granted Jun 21, 2022·0 cites·22 claims
- 2145US11249294B2Optical system and method for correcting mask defects using the systemZEISS CARL SMT GMBH·Filed 2019·Granted Feb 15, 2022·0 cites·20 claims
- 2245US10578975B2Method for correcting the critical dimension uniformity of a photomask for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·11 claims
- 2344US8592770B2Method and apparatus for DUV transmission mappingBEN-ZVI GUY·Filed 2008·Granted Nov 26, 2013·0 cites·12 claims
- 2439US8869076B2Global landmark method for critical dimension uniformity reconstructionDMITRIEV VLADIMIR·Filed 2011·Granted Oct 21, 2014·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →