Inventor · disambiguated record
Emil A. Kneer
Also filed as: KNEER EMIL · KNEER EMIL A · KNEER EMIL ANTON
27 granted patents·6 pending applications·225 citations·filing 1999–2023
96Inventor score
Files withFUJIFILM ELECTRONIC MAT USA INC22ASHLAND INC3LAM RES CORP3AIR PROD & CHEM2ARCH SPEC CHEM INC2
Top patents by PatentIndex Score
33 records- 0196US10415005B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Sep 17, 2019·7 cites·15 claims
- 0296US9562211B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Feb 7, 2017·15 cites·48 claims
- 0394US10253282B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2016·Granted Apr 9, 2019·6 cites·43 claims
- 0492US7947637B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MATERIALS·Filed 2007·Granted May 24, 2011·21 cites·34 claims
- 0591US10490417B2Etching compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2015·Granted Nov 26, 2019·6 cites·16 claims
- 0690US10533146B2Cleaning formulations for removing residues on semiconductor substratesFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Jan 14, 2020·6 cites·64 claims
- 0789US10927329B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Feb 23, 2021·2 cites·15 claims
- 0889US10696933B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Jun 30, 2020·2 cites·40 claims
- 0986US6147002AProcess for removing contaminant from a surface and composition useful thereforASHLAND INC·Filed 1999·Granted Nov 14, 2000·78 cites·23 claims
- 1085US11639487B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted May 2, 2023·0 cites·29 claims
- 1185US11618867B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Apr 4, 2023·0 cites·30 claims
- 1285US6673757B1Process for removing contaminant from a surface and composition useful thereforASHLAND INC·Filed 2000·Granted Jan 6, 2004·34 cites·23 claims
- 1383US6627546B2Process for removing contaminant from a surface and composition useful thereforASHLAND INC·Filed 2001·Granted Sep 30, 2003·21 cites·38 claims
- 1482US2022275313A1Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Application pending·0 cites
- 1581US11401487B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Aug 2, 2022·0 cites·28 claims
- 1676US11286444B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Mar 29, 2022·0 cites·25 claims
- 1773US2024174924A1Etching compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2023·Application pending·0 cites
- 1870US11898123B2Cleaning compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Feb 13, 2024·0 cites·39 claims
- 1970US9834746B2Cleaning formulations for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Dec 5, 2017·2 cites·21 claims
- 2067US9771550B2Cleaning formulation for removing residues on surfacesFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Sep 26, 2017·1 cites·45 claims
- 2163US6767427B2Apparatus and method for conditioning polishing pad in a chemical mechanical planarization processLAM RES CORP·Filed 2001·Granted Jul 27, 2004·13 cites·26 claims
- 2259US6652708B2Methods and apparatus for conditioning and temperature control of a processing surfaceLAM RES CORP·Filed 2001·Granted Nov 25, 2003·5 cites·19 claims
- 2359US2020248075A1Etching compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Application pending·0 cites
- 2457US7700534B2Process for removing contaminant from a surface and composition useful therefor descriptionAIR PROD & CHEM·Filed 2008·Granted Apr 20, 2010·0 cites·7 claims
- 2557US2020020545A1Etching CompositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Application pending·0 cites
- 2656US11268025B2Etching compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Mar 8, 2022·0 cites·40 claims
- 2755US11268024B2Etching compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Mar 8, 2022·0 cites·24 claims
- 2855US7524801B2Process for removing contaminant from a surface and composition useful thereforAIR PROD & CHEM·Filed 2003·Granted Apr 28, 2009·3 cites·17 claims
- 2954US10787628B2Cleaning compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Sep 29, 2020·0 cites·90 claims
- 3051US10626353B2Cleaning formulationsFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Apr 21, 2020·0 cites·37 claims
- 3146US7147798B2Aqueous based metal etchantARCH SPEC CHEM INC·Filed 2004·Granted Dec 12, 2006·3 cites·6 claims
- 3242US2004074599A1Methods and apparatus for conditioning and temperature control of a processing surfaceLAM RES CORP·Filed 2003·Application pending·0 cites
- 3341US2005266695A1Novel aqueous based metal etchantARCH SPEC CHEM INC·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →