Inventor · disambiguated record
Hun Sang Kim
Also filed as: KIM HUN · KIM HUN SANG
9 granted patents·3 pending applications·183 citations·filing 2008–2018
86Inventor score
Top patents by PatentIndex Score
12 records- 0195US9425058B2Simplified litho-etch-litho-etch processAPPLIED MATERIALS INC·Filed 2014·Granted Aug 23, 2016·145 cites·15 claims
- 0285US8133819B2Plasma etching carbonaceous layers with sulfur-based etchantsWANG JUDY·Filed 2008·Granted Mar 13, 2012·16 cites·18 claims
- 0382US9287124B2Method of etching a boron doped carbon hardmaskAPPLIED MATERIALS INC·Filed 2014·Granted Mar 15, 2016·8 cites·17 claims
- 0481US10186444B2Gas flow for condensation reduction with a substrate processing chuckAPPLIED MATERIALS INC·Filed 2015·Granted Jan 22, 2019·3 cites·15 claims
- 0578US11532801B2Organic electroluminescent device comprising a redox-doped electron transport layer and an auxiliary electron transport layerNOVALED GMBH·Filed 2017·Granted Dec 20, 2022·2 cites·11 claims
- 0672US8293656B2Selective self-aligned double patterning of regions in an integrated circuit deviceKIM HUN SANG·Filed 2009·Granted Oct 23, 2012·8 cites·19 claims
- 0769US11094511B2Processing chamber with substrate edge enhancement processingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·1 cites·14 claims
- 0856US10770329B2Gas flow for condensation reduction with a substrate processing chuckAPPLIED MATERIALS INC·Filed 2018·Granted Sep 8, 2020·0 cites·13 claims
- 0944US9627216B2Method for forming features in a silicon containing layerAPPLIED MATERIALS INC·Filed 2014·Granted Apr 18, 2017·0 cites·20 claims
- 1043US2014212994A1Self aligned dual patterning technique enhancement with magnetic shieldingAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 1140US2015064880A1Post etch treatment technology for enhancing plasma-etched silicon surface stability in ambientAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1240US2015371889A1Methods for shallow trench isolation formation in a silicon germanium layerAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →