Inventor · disambiguated record
Laisheng Sun
Also filed as: SUN LAISHENG
8 granted patents·8 pending applications·15 citations·filing 2013–2022
78Inventor score
Top patents by PatentIndex Score
16 records- 0194US12110435B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2022·Granted Oct 8, 2024·3 cites·18 claims
- 0288US10176979B2Post-CMP removal using compositions and method of useENTEGRIS INC·Filed 2013·Granted Jan 8, 2019·10 cites·21 claims
- 0376US11035044B2Etching solution for tungsten and GST filmsVERSUM MAT US LLC·Filed 2018·Granted Jun 15, 2021·1 cites·25 claims
- 0470US10557107B2Post chemical mechanical polishing formulations and method of useENTEGRIS INC·Filed 2018·Granted Feb 11, 2020·1 cites·8 claims
- 0560US12298669B2Composition comprising three alkanolamines and a hydroxylamine for removing etch residuesVERSUM MAT US LLC·Filed 2020·Granted May 13, 2025·0 cites·11 claims
- 0659US12281251B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 0759US2025002823A1Compositions For Removing Photoresist And Etch Residue From A Substrate With Copper Corrosion Inhibitor And Uses ThereofVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 0854US12325844B2Photoresist removerVERSUM MAT US LLC·Filed 2020·Granted Jun 10, 2025·0 cites·18 claims
- 0952US11091727B2Post etch residue cleaning compositions and methods of using the sameVERSUM MAT US LLC·Filed 2019·Granted Aug 17, 2021·0 cites·17 claims
- 1046US2022251480A1Compositions for removing etch residues, methods of using and use thereofVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 1145US2022298417A1Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 1244US2022243150A1Cleaning Composition For Semiconductor SubstratesVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 1342US2016122696A1Compositions and methods for removing ceria particles from a surfaceADVANCED TECH MATERIALS·Filed 2014·Application pending·0 cites
- 1441US2016340620A1Post chemical mechanical polishing formulations and method of useADVANCED TECH MATERIALS·Filed 2015·Application pending·0 cites
- 1541US2016075971A1Copper cleaning and protection formulationsLIU JUN·Filed 2014·Application pending·0 cites
- 1637US2015045277A1Post-cmp formulation having improved barrier layer compatibility and cleaning performanceENTEGRIS INC·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →