Inventor · disambiguated record
Joseph P. Dzengeleski
Also filed as: DZENGELESKI JOSEPH · DZENGELESKI JOSEPH P
11 granted patents·4 pending applications·32 citations·filing 2003–2019
86Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT10VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2APPLIED MATERIALS INC1DZENGELESKI JOSEPH P1VARIAN SEMICONDUCTOR E1QUIPMEN1
Top patents by PatentIndex Score
15 records- 0186US7498590B2Scan pattern for an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Mar 3, 2009·10 cites·18 claims
- 0279US10925146B1Ion source chamber with embedded heaterAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·3 cites·19 claims
- 0371US9287085B2Processing apparatus and method of treating a substrateVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 15, 2016·2 cites·17 claims
- 0470US7652270B2Techniques for ion beam current measurement using a scanning beam current transformerVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Jan 26, 2010·2 cites·16 claims
- 0570US7442944B2Ion beam implant current, spot width and position tuningVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Oct 28, 2008·9 cites·25 claims
- 0668US9734991B2Negative ribbon ion beams from pulsed plasmasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 15, 2017·1 cites·20 claims
- 0763US7521691B2Magnetic monitoring of a Faraday cup for an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Apr 21, 2009·2 cites·32 claims
- 0862US8698108B1Ion beam measurement system and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Apr 15, 2014·1 cites·18 claims
- 0957US10290470B2Negative ribbon ion beams from pulsed plasmasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·0 cites·14 claims
- 1054US7564048B2Automated faraday sensor test systemVARIAN SEMICONDUCTOR E1QUIPMEN·Filed 2006·Granted Jul 21, 2009·2 cites·17 claims
- 1148US7383141B2Faraday system integrity determinationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Jun 3, 2008·0 cites·24 claims
- 1247US2010155600A1Method and apparatus for plasma dose measurementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 1347US2010159120A1Plasma ion process uniformity monitorVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 1438US2012021136A1System and method for controlling plasma deposition uniformityDZENGELESKI JOSEPH P·Filed 2010·Application pending·0 cites
- 1535US2005133728A1Method and system for in-situ calibration of a dose controller for ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →