Inventor · disambiguated record
Dong-Woon Shin
Also filed as: SHIN DONG-WOON
7 granted patents·4 pending applications·21 citations·filing 2008–2014
78Inventor score
Files withSAMSUNG ELECTRONICS CO LTD7GLOBALFOUNDRIES INC1HONG SOO-JIN1PARK YOUNG-GEUN1SHIN DONG-WOON1
Top patents by PatentIndex Score
11 records- 0178US7807543B2Methods of manufacturing trench isolation structures using selective plasma ion immersion implantation and deposition (PIIID)SAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 5, 2010·8 cites·16 claims
- 0271US8097531B2Methods of manufacturing charge trap type memory devicesPARK YOUNG-GEUN·Filed 2010·Granted Jan 17, 2012·4 cites·10 claims
- 0370US7871897B2Method of forming shallow trench isolation regions in devices with NMOS and PMOS regionsSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jan 18, 2011·5 cites·20 claims
- 0469US7785985B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 31, 2010·4 cites·19 claims
- 0559US9230922B2Precursor composition for deposition of silicon dioxide film and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 5, 2016·0 cites·17 claims
- 0648US2010055856A1Method of forming oxide layer, and method of manufacturing semiconductor deviceHONG SOO-JIN·Filed 2009·Application pending·0 cites
- 0747US9761691B2Integrated circuits including replacement gate structures and methods for fabricating the sameGLOBALFOUNDRIES INC·Filed 2014·Granted Sep 12, 2017·0 cites·14 claims
- 0847US2009325356A1Methods of forming a low temperature deposition layer and methods of manufacturing semiconductor device using the sameSHIN DONG-WOON·Filed 2009·Application pending·0 cites
- 0944US8877634B2Methods of forming a fine pattern on a substrate and methods of forming a semiconductor device having a fine patternSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Nov 4, 2014·0 cites·10 claims
- 1044US2010117141A1Memory cell transistors having limited charge spreading, non-volatile memory devices including such transistors, and methods of formation thereofSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1136US2010210116A1Methods of forming vapor thin films and semiconductor integrated circuit devices including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →