Inventor · disambiguated record
Sanjay K. Yedur
Also filed as: YEDUR SANJAY · YEDUR SANJAY K
42 granted patents·1,071 citations·filing 1998–2007
98Inventor score
Top patents by PatentIndex Score
42 records- 0192US6813574B1Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus thereforADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 2, 2004·70 cites·20 claims
- 0292US6566655B1Multi-beam SEM for sidewall imagingADVANCED MICRO DEVICES INC·Filed 2000·Granted May 20, 2003·44 cites·41 claims
- 0391US7046375B2Edge roughness measurement in optical metrologyTIMBRE TECH INC·Filed 2003·Granted May 16, 2006·41 cites·46 claims
- 0490US6459482B1Grainless material for calibration sampleADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 1, 2002·32 cites·22 claims
- 0589US7092110B2Optimized model and parameter selection for optical metrologyTIMBRE TECH INC·Filed 2003·Granted Aug 15, 2006·68 cites·46 claims
- 0689US6451512B1UV-enhanced silylation process to increase etch resistance of ultra thin resistsADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 17, 2002·36 cites·19 claims
- 0787US6884999B1Use of scanning probe microscope for defect detection and repairADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 26, 2005·39 cites·21 claims
- 0887US6376013B1Multiple nozzles for dispensing resistADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 23, 2002·89 cites·30 claims
- 0987US6354133B1Use of carbon nanotubes to calibrate conventional tips used in AFMADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 12, 2002·66 cites·20 claims
- 1086US6829380B1Optimization of OPC design factors utilizing an advanced algorithm on a low voltage CD-SEM systemADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 7, 2004·26 cites·11 claims
- 1186US6591658B1Carbon nanotubes as linewidth standards for SEM & AFMADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 15, 2003·61 cites·35 claims
- 1278US6187666B1CVD plasma process to fill contact hole in damascene processADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 13, 2001·43 cites·14 claims
- 1377US6545273B1Use of multiple tips on AFM to deconvolve tip effectsADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 8, 2003·34 cites·26 claims
- 1477US6396059B1Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEMADVANCED MICRO DEVICES INC·Filed 2000·Granted May 28, 2002·13 cites·29 claims
- 1577US6190062B1Cleaning chamber built into SEM for plasma or gaseous phase cleaningADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 20, 2001·12 cites·22 claims
- 1676US7518740B2Evaluating a profile model to characterize a structure to be examined using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Apr 14, 2009·9 cites·20 claims
- 1776US7480062B2Automated process control using parameters determined from a photomask covered by a pellicleTOKYO ELECTRON LTD·Filed 2007·Granted Jan 20, 2009·4 cites·14 claims
- 1876US6270579B1Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 7, 2001·40 cites·27 claims
- 1975US6635874B1Self-cleaning technique for contamination on calibration sample in SEMADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 21, 2003·11 cites·25 claims
- 2075US6437329B1Use of carbon nanotubes as chemical sensors by incorporation of fluorescent molecules within the tubeADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 20, 2002·65 cites·22 claims
- 2173US6248175B1Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 19, 2001·36 cites·22 claims
- 2270US6191046B1Deposition of an oxide layer to facilitate photoresist rework on polygate layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 20, 2001·36 cites·19 claims
- 2369US6373053B1Analysis of CD-SEM signal to detect scummed/closed contact holes and linesADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 16, 2002·12 cites·21 claims
- 2468US6197455B1Lithographic mask repair using a scanning tunneling microscopeADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 6, 2001·25 cites·19 claims
- 2568US6034771ASystem for uniformly heating photoresistADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 7, 2000·25 cites·41 claims
- 2665US6452161B1Scanning probe microscope having optical fiber spaced from point of hpADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 17, 2002·13 cites·20 claims
- 2763US7394554B2Selecting a hypothetical profile to use in optical metrologyTIMBRE TECH INC·Filed 2003·Granted Jul 1, 2008·10 cites·32 claims
- 2863US6541184B1Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 1, 2003·7 cites·7 claims
- 2960US6479817B1Cantilever assembly and scanning tip therefor with associated optical sensorADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 12, 2002·10 cites·32 claims
- 3060US6326231B1Use of silicon oxynitride ARC for metal layersADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 4, 2001·23 cites·20 claims
- 3159US6423479B1Cleaning carbon contamination on mask using gaseous phaseADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 23, 2002·5 cites·20 claims
- 3259US6117618ACarbonized antireflective coating produced by spin-on polymer materialADVANCED MICRO DEVICES INC·Filed 1998·Granted Sep 12, 2000·22 cites·20 claims
- 3358US6441349B1System for facilitating uniform heating temperature of photoresistADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 27, 2002·5 cites·42 claims
- 3455US6592932B2Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·4 cites·11 claims
- 3554US7702471B2Determining one or more profile parameters of a photomask covered by a pellicleTOKYO ELECTRON LTD·Filed 2007·Granted Apr 20, 2010·2 cites·19 claims
- 3654US6455847B1Carbon nanotube probes in atomic force microscope to detect partially open/closed contactsADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·11 cites·21 claims
- 3752US6371134B2Ozone cleaning of wafersADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 16, 2002·3 cites·18 claims
- 3848US6444381B1Electron beam flood exposure technique to reduce the carbon contaminationADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 3, 2002·7 cites·22 claims
- 3946US7639375B2Determining transmittance of a photomask using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·0 cites·20 claims
- 4041US6605855B1CVD plasma process to fill contact hole in damascene processADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 12, 2003·0 cites·11 claims
- 4140US6057914AMethod for detecting and identifying a lens aberration by measurement of sidewall angles by atomic force microscopyADVANCED MICRO DEVICES INC·Filed 1999·Granted May 2, 2000·7 cites·17 claims
- 4237US6245493B1Method for reducing surface reflectivity by increasing surface roughnessFiled 1998·Granted Jun 12, 2001·5 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →