Inventor · disambiguated record
Michael K. Templeton
Also filed as: TEMPLETON MICHAEL · TEMPLETON MICHAEL K · TEMPLETON MICHAEL KARPOVICH
96 granted patents·3 pending applications·3,055 citations·filing 1991–2005
99Inventor score
Top patents by PatentIndex Score
99 records- 0199US6688784B1Parallel plate development with multiple holes in top plate for control of developer flow and pressureADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 10, 2004·572 cites·21 claims
- 0299US6534243B1Chemical feature doubling processADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·249 cites·20 claims
- 0396US6561706B2Critical dimension monitoring from latent imageADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·97 cites·11 claims
- 0496US6492075B1Chemical trim processADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 10, 2002·83 cites·22 claims
- 0594US6879051B1Systems and methods to determine seed layer thickness of trench sidewallsADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 12, 2005·56 cites·12 claims
- 0694US6771374B1Scatterometry based measurements of a rotating substrateADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 3, 2004·67 cites·22 claims
- 0794US6455416B1Developer soluble dyed BARC for dual damascene processADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·79 cites·20 claims
- 0892US6650422B2Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewithADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 18, 2003·58 cites·24 claims
- 0992US6291137B1Sidewall formation for sidewall patterning of sub 100 nm structuresADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 18, 2001·132 cites·20 claims
- 1091US6834158B1Pinhole defect repair by resist flowADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 21, 2004·36 cites·36 claims
- 1190US6459482B1Grainless material for calibration sampleADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 1, 2002·32 cites·22 claims
- 1290US6420702B1Non-charging critical dimension SEM metrology standardADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 16, 2002·33 cites·22 claims
- 1390US6274289B1Chemical resist thickness reduction processADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 14, 2001·37 cites·20 claims
- 1489US6752899B1Acoustic microbalance for in-situ deposition process monitoring and controlADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 22, 2004·43 cites·19 claims
- 1589US6451512B1UV-enhanced silylation process to increase etch resistance of ultra thin resistsADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 17, 2002·36 cites·19 claims
- 1688US6556303B1Scattered signal collection using strobed techniqueADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 29, 2003·43 cites·45 claims
- 1787US6664191B1Non self-aligned shallow trench isolation process with disposable space to define sub-lithographic poly spaceADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 16, 2003·38 cites·29 claims
- 1887US6573497B1Calibration of CD-SEM by e-beam induced current measurementADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 3, 2003·26 cites·22 claims
- 1987US6445072B1Deliberate void in innerlayer dielectric gapfill to reduce dielectric constantADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 3, 2002·48 cites·14 claims
- 2087US6376013B1Multiple nozzles for dispensing resistADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 23, 2002·89 cites·30 claims
- 2187US6354133B1Use of carbon nanotubes to calibrate conventional tips used in AFMADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 12, 2002·66 cites·20 claims
- 2286US7943289B2Inverse resist coating processGLOBALFOUNDRIES INC·Filed 2005·Granted May 17, 2011·9 cites·20 claims
- 2386US7100826B1Barcode marking of wafer products for inventory controlADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 5, 2006·36 cites·30 claims
- 2486US6591658B1Carbon nanotubes as linewidth standards for SEM & AFMADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 15, 2003·61 cites·35 claims
- 2585US6828162B1System and method for active control of BPSG depositionADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 7, 2004·32 cites·15 claims
- 2685US6573498B1Electric measurement of reference sample in a CD-SEM and method for calibrationADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 3, 2003·25 cites·22 claims
- 2783US7078348B1Dual layer patterning scheme to make dual damasceneADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 18, 2006·35 cites·18 claims
- 2883US6774989B1Interlayer dielectric void detectionADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 10, 2004·21 cites·11 claims
- 2983US6704101B1Scatterometry based measurements of a moving substrateADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 9, 2004·22 cites·23 claims
- 3083US6645702B1Treat resist surface to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 11, 2003·21 cites·22 claims
- 3183US6455888B1Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringersADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·10 cites·11 claims
- 3282US6670271B1Growing a dual damascene structure using a copper seed layer and a damascene resist structureADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 30, 2003·27 cites·30 claims
- 3382US5128230AQuinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetateSHIPLEY CO·Filed 1991·Granted Jul 7, 1992·40 cites·9 claims
- 3481US6545753B2Using scatterometry for etch end points for dual damascene processADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 8, 2003·31 cites·16 claims
- 3581US6196734B1CD uniformity by active control of developer temperatureADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 6, 2001·8 cites·20 claims
- 3680US7153364B1Re-circulation and reuse of dummy-dispensed resistADVANCE MICRO DEVICES INC·Filed 2001·Granted Dec 26, 2006·20 cites·12 claims
- 3779US6238830B1Active control of temperature in scanning probe lithography and maskless lithograpyADVANCED MICRO DEVICES INC·Filed 1999·Granted May 29, 2001·40 cites·37 claims
- 3878US6819427B1Apparatus of monitoring and optimizing the development of a photoresist materialADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 16, 2004·16 cites·23 claims
- 3978US6269322B1System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlayADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 31, 2001·45 cites·20 claims
- 4078US6187666B1CVD plasma process to fill contact hole in damascene processADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 13, 2001·43 cites·14 claims
- 4176US6270579B1Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 7, 2001·40 cites·27 claims
- 4275US6635874B1Self-cleaning technique for contamination on calibration sample in SEMADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 21, 2003·11 cites·25 claims
- 4375US6630361B1Use of scatterometry for in-situ control of gaseous phase chemical trim processADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 7, 2003·19 cites·21 claims
- 4474US6634805B1Parallel plate developmentADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 21, 2003·16 cites·18 claims
- 4574US6552790B1System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlayADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 22, 2003·12 cites·36 claims
- 4673US6248175B1Nozzle arm movement for resist developmentADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 19, 2001·36 cites·22 claims
- 4772US6613500B1Reducing resist residue defects in open area on patterned wafer using trim maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 2, 2003·11 cites·22 claims
- 4871US6562248B1Active control of phase shift mask etching processADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·11 cites·8 claims
- 4970US7145653B1In situ particle monitoring for defect reductionADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 5, 2006·13 cites·20 claims
- 5070US6889763B1System for rapidly and uniformly cooling resistADVANCED MICRO DEVICES INC·Filed 2000·Granted May 10, 2005·13 cites·10 claims
Showing the top 50 of 99 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →