Inventor · disambiguated record
Bhanwar Singh
Also filed as: SINGH BHANWAR
259 granted patents·5 pending applications·6,724 citations·filing 1990–2009
99Inventor score
Files withADVANCED MICRO DEVICES INC247GLOBALFOUNDRIES INC3ADVANCED MICRO DEVICES LLP1ADVANCED MICRO TECHNOLOGIES IN1CAIN JASON P1
Top patents by PatentIndex Score
264 records- 0198US7262422B2Use of supercritical fluid to dry wafer and clean lens in immersion lithographyADVANCED MICRO DEVICES INC·Filed 2005·Granted Aug 28, 2007·44 cites·20 claims
- 0298US6514849B1Method of forming smaller contact size using a spacer hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 4, 2003·297 cites·13 claims
- 0397US6383952B1RELACS process to double the frequency or pitch of small feature formationADVANCED MICRO DEVICES INC·Filed 2001·Granted May 7, 2002·140 cites·10 claims
- 0496US6844206B1Refractive index system monitor and control for immersion lithographyADVANCED MICRO DEVICES LLP·Filed 2003·Granted Jan 18, 2005·127 cites·20 claims
- 0596US6561706B2Critical dimension monitoring from latent imageADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·97 cites·11 claims
- 0696US6541360B1Bi-layer trim etch process to form integrated circuit gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 1, 2003·101 cites·26 claims
- 0796US6475867B1Method of forming integrated circuit features by oxidation of titanium hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 5, 2002·125 cites·20 claims
- 0895US7080330B1Concurrent measurement of critical dimension and overlay in semiconductor manufacturingADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 18, 2006·79 cites·25 claims
- 0995US6594024B1Monitor CMP process using scatterometryADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·103 cites·26 claims
- 1095US6534418B1Use of silicon containing imaging layer to define sub-resolution gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·97 cites·20 claims
- 1194US6879051B1Systems and methods to determine seed layer thickness of trench sidewallsADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 12, 2005·56 cites·12 claims
- 1294US6771374B1Scatterometry based measurements of a rotating substrateADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 3, 2004·67 cites·22 claims
- 1394US6455416B1Developer soluble dyed BARC for dual damascene processADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·79 cites·20 claims
- 1493US7749662B2Process margin using discrete assist featuresGLOBALFOUNDRIES INC·Filed 2005·Granted Jul 6, 2010·109 cites·19 claims
- 1593US7187796B1Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabricationADVANCED MICRO DEVICES INC·Filed 2003·Granted Mar 6, 2007·45 cites·14 claims
- 1693US6784446B1Reticle defect printability verification by resist latent image comparisonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 31, 2004·53 cites·24 claims
- 1793US6570157B1Multi-pitch and line calibration for mask and wafer CD-SEM systemADVANCED MICRO DEVICES INC·Filed 2000·Granted May 27, 2003·69 cites·20 claims
- 1893US6486078B1Super critical drying of low k materialsADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 26, 2002·69 cites·20 claims
- 1993US6451621B1Using scatterometry to measure resist thickness and control implantADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 17, 2002·61 cites·6 claims
- 2093US6057239ADual damascene process using sacrificial spin-on materialsADVANCED MICRO DEVICES INC·Filed 1997·Granted May 2, 2000·118 cites·19 claims
- 2192US7224456B1In-situ defect monitor and control system for immersion medium in immersion lithographyADVANCED MICRO DEVICES INC·Filed 2004·Granted May 29, 2007·44 cites·15 claims
- 2292US6813574B1Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus thereforADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 2, 2004·70 cites·20 claims
- 2392US6650422B2Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewithADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 18, 2003·58 cites·24 claims
- 2492US6566655B1Multi-beam SEM for sidewall imagingADVANCED MICRO DEVICES INC·Filed 2000·Granted May 20, 2003·44 cites·41 claims
- 2592US6510730B1System and method for facilitating selection of optimized optical proximity correctionADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 28, 2003·39 cites·17 claims
- 2691US7065737B2Multi-layer overlay measurement and correction technique for IC manufacturingADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 20, 2006·51 cites·30 claims
- 2791US6999254B1Refractive index system monitor and control for immersion lithographyADVANCED MICRO DEVICES INC·Filed 2004·Granted Feb 14, 2006·31 cites·35 claims
- 2891US6665065B1Defect detection in pellicized reticles via exposure at short wavelengthsADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 16, 2003·72 cites·36 claims
- 2991US6593748B1Process integration of electrical thickness measurement of gate oxide and tunnel oxides by corona discharge techniqueADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·44 cites·49 claims
- 3091US6559457B1System and method for facilitating detection of defects on a waferADVANCED MICRO DEVICES INC·Filed 2000·Granted May 6, 2003·52 cites·20 claims
- 3190US7158896B1Real time immersion medium control using scatterometryADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·35 cites·25 claims
- 3290US7076320B1Scatterometry monitor in cluster process tool environment for advanced process control (APC)ADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 11, 2006·44 cites·24 claims
- 3390US7056646B1Use of base developers as immersion lithography fluidADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 6, 2006·37 cites·20 claims
- 3490US6654660B1Controlling thermal expansion of mask substrates by scatterometryADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 25, 2003·36 cites·26 claims
- 3590US6562185B2Wafer based temperature sensors for characterizing chemical mechanical polishing processesADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·35 cites·31 claims
- 3690US6459482B1Grainless material for calibration sampleADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 1, 2002·32 cites·22 claims
- 3790US6448097B1Measure fluorescence from chemical released during trim etchADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 10, 2002·48 cites·28 claims
- 3890US6420702B1Non-charging critical dimension SEM metrology standardADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 16, 2002·33 cites·22 claims
- 3990US6417084B1T-gate formation using a modified conventional poly processADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 9, 2002·50 cites·19 claims
- 4089US7309659B1Silicon-containing resist to pattern organic low k-dielectricsADVANCED MICRO DEVICES INC·Filed 2005·Granted Dec 18, 2007·15 cites·20 claims
- 4189US7235414B1Using scatterometry to verify contact hole opening during tapered bilayer etchADVANCED MICRO DEVICES INC·Filed 2005·Granted Jun 26, 2007·13 cites·20 claims
- 4289US6954678B1Artificial intelligence system for track defect problem solvingADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 11, 2005·44 cites·31 claims
- 4389US6752899B1Acoustic microbalance for in-situ deposition process monitoring and controlADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 22, 2004·43 cites·19 claims
- 4489US6501534B1Automated periodic focus and exposure calibration of a lithography stepperADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 31, 2002·36 cites·31 claims
- 4589US6451512B1UV-enhanced silylation process to increase etch resistance of ultra thin resistsADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 17, 2002·36 cites·19 claims
- 4688US7251033B1In-situ reticle contamination detection system at exposure wavelengthADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 31, 2007·30 cites·17 claims
- 4788US7069155B1Real time analytical monitor for soft defects on reticle during reticle inspectionADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 27, 2006·25 cites·24 claims
- 4888US6830850B1Interferometric lithography using reflected light from applied layersADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 14, 2004·35 cites·25 claims
- 4988US6556303B1Scattered signal collection using strobed techniqueADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 29, 2003·43 cites·45 claims
- 5088US6403456B1T or T/Y gate formation using trim etch processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 11, 2002·48 cites·20 claims
Showing the top 50 of 264 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →