Inventor · disambiguated record
Herbert E. Litvak
Also filed as: LITVAK HERBERT · LITVAK HERBERT E · LITVAK HERBERT ELLIOT
24 granted patents·1,261 citations·filing 1990–2008
97Inventor score
Top patents by PatentIndex Score
24 records- 0197US6068539AWafer polishing device with movable windowLAM RES CORP·Filed 1998·Granted May 30, 2000·200 cites·35 claims
- 0296US6254459B1Wafer polishing device with movable windowLAM RES CORP·Filed 1999·Granted Jul 3, 2001·143 cites·20 claims
- 0394US6010538AIn situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication linkLUXTRON CORP·Filed 1996·Granted Jan 4, 2000·216 cites·44 claims
- 0494US5499733AOptical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1993·Granted Mar 19, 1996·139 cites·23 claims
- 0593US5695660AOptical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1996·Granted Dec 9, 1997·98 cites·46 claims
- 0686US6077452AOptical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1999·Granted Jun 20, 2000·56 cites·30 claims
- 0786US6027760APhotoresist coating process control with solvent vapor sensorFiled 1997·Granted Feb 22, 2000·64 cites·25 claims
- 0885US6641470B1Apparatus for accurate endpoint detection in supported polishing padsLAM RES CORP·Filed 2001·Granted Nov 4, 2003·43 cites·37 claims
- 0982US7072028B2Method and apparatus for chemical monitoringLIGHTWIND CORP·Filed 2004·Granted Jul 4, 2006·16 cites·44 claims
- 1082US6413147B1Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentFiled 2000·Granted Jul 2, 2002·22 cites·15 claims
- 1181US7580119B2Method and apparatus for chemical monitoringLIGHTWIND CORP·Filed 2008·Granted Aug 25, 2009·5 cites·5 claims
- 1279US7456939B2Method and apparatus for chemical monitoringLIGHTWIND CORP·Filed 2006·Granted Nov 25, 2008·4 cites·2 claims
- 1379US5308447AEndpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layerLUXTRON CORP·Filed 1992·Granted May 3, 1994·77 cites·34 claims
- 1477US5190614AMethod of endpoint detection and structure thereforLUXTRON CORP·Filed 1990·Granted Mar 2, 1993·41 cites·5 claims
- 1574US6426232B1Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1998·Granted Jul 30, 2002·35 cites·23 claims
- 1669US5891352AOptical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1997·Granted Apr 6, 1999·27 cites·26 claims
- 1767US6612902B1Method and apparatus for end point triggering with integrated steeringLAM RES CORP·Filed 2001·Granted Sep 2, 2003·10 cites·25 claims
- 1863US5414504AInterference removalXINIX INC·Filed 1993·Granted May 9, 1995·12 cites·28 claims
- 1960US6110752AOptical techniques of measuring endpoint during the processing of material layers in an optically hostile environmentLUXTRON CORP·Filed 1997·Granted Aug 29, 2000·17 cites·24 claims
- 2060US5208644AInterference removalXINIX INC·Filed 1990·Granted May 4, 1993·12 cites·6 claims
- 2158US7217371B2Optical control interface between controller and process chamberLIGHTWIND CORP·Filed 2004·Granted May 15, 2007·3 cites·13 claims
- 2250US5786886AInterference removalLUXTRON CORP·Filed 1995·Granted Jul 28, 1998·11 cites·24 claims
- 2339US5946082AInterference removalLUXTRON CORP·Filed 1998·Granted Aug 31, 1999·5 cites·17 claims
- 2428US5064269ALight collection method and apparatusXINIX INC·Filed 1990·Granted Nov 12, 1991·5 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →