Inventor · disambiguated record
John Anthony Thomas Norman
Also filed as: NORMAN JOHN A · NORMAN JOHN A T · NORMAN JOHN ANTHONY THOMAS
57 granted patents·11 pending applications·3,038 citations·filing 1986–2019
99Inventor score
Files withAIR PROD & CHEM49NORMAN JOHN ANTHONY THOMAS9UARCO INC2VERSUM MAT US LLC2APPLIED MATERIALS INC1
Top patents by PatentIndex Score
68 records- 0199US6846515B2Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2002·Granted Jan 25, 2005·667 cites·99 claims
- 0299US6552209B1Preparation of metal imino/amino complexes for metal oxide and metal nitride thin filmsAIR PROD & CHEM·Filed 2002·Granted Apr 22, 2003·572 cites·21 claims
- 0398US6238734B1Liquid precursor mixtures for deposition of multicomponent metal containing materialsAIR PROD & CHEM·Filed 1999·Granted May 29, 2001·570 cites·11 claims
- 0497US6537613B1Process for metal metalloid oxides and nitrides with compositional gradientsAIR PROD & CHEM·Filed 2000·Granted Mar 25, 2003·155 cites·28 claims
- 0596US7205422B2Volatile metal β-ketoiminate and metal β-diiminate complexesAIR PROD & CHEM·Filed 2005·Granted Apr 17, 2007·32 cites·18 claims
- 0696US7034169B1Volatile metal β-ketoiminate complexesAIR PROD & CHEM·Filed 2005·Granted Apr 25, 2006·22 cites·15 claims
- 0793US8962875B2Metal-enolate precursors for depositing metal-containing filmsNORMAN JOHN ANTHONY THOMAS·Filed 2012·Granted Feb 24, 2015·7 cites·8 claims
- 0892US6869876B2Process for atomic layer deposition of metal filmsAIR PROD & CHEM·Filed 2002·Granted Mar 22, 2005·71 cites·30 claims
- 0992US5085731AVolatile liquid precursors for the chemical vapor deposition of copperAIR PROD & CHEM·Filed 1991·Granted Feb 4, 1992·120 cites·11 claims
- 1091US5322712AProcess for improved quality of CVD copper filmsAIR PROD & CHEM·Filed 1993·Granted Jun 21, 1994·72 cites·7 claims
- 1191US5098516AProcesses for the chemical vapor deposition of copper and etching of copperAIR PROD & CHEM·Filed 1990·Granted Mar 24, 1992·143 cites·12 claims
- 1291US5028724ASynthesis of volatile fluorinated and non-fluorinated metal-beta-ketonate and metal-beta-ketoiminato complexesAIR PROD & CHEM·Filed 1990·Granted Jul 2, 1991·38 cites·43 claims
- 1390US6818783B2Volatile precursors for deposition of metals and metal-containing filmsAIR PROD & CHEM·Filed 2002·Granted Nov 16, 2004·31 cites·36 claims
- 1490US5187300AVolatile precursors for copper CVDAIR PROD & CHEM·Filed 1991·Granted Feb 16, 1993·41 cites·7 claims
- 1589US6503561B1Liquid precursor mixtures for deposition of multicomponent metal containing materialsAIR PROD & CHEM·Filed 2000·Granted Jan 7, 2003·40 cites·23 claims
- 1687US9994954B2Volatile dihydropyrazinly and dihydropyrazine metal complexesAIR PROD & CHEM·Filed 2014·Granted Jun 12, 2018·2 cites·2 claims
- 1785US7384471B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2003·Granted Jun 10, 2008·28 cites·35 claims
- 1885US5144049AVolatile liquid precursors for the chemical vapor deposition of copperAIR PROD & CHEM·Filed 1991·Granted Sep 1, 1992·63 cites·9 claims
- 1984US7943195B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2008·Granted May 17, 2011·8 cites·20 claims
- 2083US8293001B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsVRTIS RAYMOND NICHOLAS·Filed 2011·Granted Oct 23, 2012·6 cites·4 claims
- 2183US7754906B2Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitridesAIR PROD & CHEM·Filed 2006·Granted Jul 13, 2010·4 cites·3 claims
- 2281US5221366AEtching agents comprising β-diketone and β-ketoimine ligands and a process for using the sameAIR PROD & CHEM·Filed 1991·Granted Jun 22, 1993·36 cites·13 claims
- 2379US10914001B2Volatile dihydropyrazinly and dihydropyrazine metal complexesVERSUM MAT US LLC·Filed 2019·Granted Feb 9, 2021·0 cites·14 claims
- 2479US5319118AVolatile barium precursor and use of precursor in OMCVD processAIR PROD & CHEM·Filed 1991·Granted Jun 7, 1994·17 cites·3 claims
- 2577US5094701ACleaning agents comprising beta-diketone and beta-ketoimine ligands and a process for using the sameAIR PROD & CHEM·Filed 1991·Granted Mar 10, 1992·66 cites·35 claims
- 2675US6500499B1Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursorsAIR PROD & CHEM·Filed 2000·Granted Dec 31, 2002·14 cites·18 claims
- 2774US8313807B2High coordination sphere group 2 metal β-diketiminate precursorsNORMAN JOHN ANTHONY THOMAS·Filed 2009·Granted Nov 20, 2012·2 cites·17 claims
- 2874US7311946B2Methods for depositing metal films on diffusion barrier layers by CVD or ALD processesAIR PROD & CHEM·Filed 2003·Granted Dec 25, 2007·13 cites·18 claims
- 2974US5008415AVolatile fluorinated β-ketoimines and associated metal complexesAIR PROD & CHEM·Filed 1989·Granted Apr 16, 1991·11 cites·7 claims
- 3073US8680289B2Complexes of imidazole ligandsNORMAN JOHN ANTHONY THOMAS·Filed 2012·Granted Mar 25, 2014·1 cites·32 claims
- 3173US8283485B2Process for selectively depositing copper thin films on substrates with copper and ruthenium areas via vapor depositionNORMAN JOHN ANTHONY THOMAS·Filed 2008·Granted Oct 9, 2012·4 cites·7 claims
- 3272US2018327900A1Volatile Dihydropyrazinly and Dihydropyrazine Metal ComplexesVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
- 3371US6838573B1Copper CVD precursors with enhanced adhesion propertiesAIR PROD & CHEM·Filed 2004·Granted Jan 4, 2005·7 cites·20 claims
- 3469US4892246APostcard with tear out return postcardUARCO INC·Filed 1989·Granted Jan 9, 1990·26 cites·10 claims
- 3567US4735634APillared cobalt complexes for oxygen separationAIR PROD & CHEM·Filed 1986·Granted Apr 5, 1988·9 cites·20 claims
- 3664US8263795B2Copper precursors for thin film depositionNORMAN JOHN ANTHONY THOMAS·Filed 2008·Granted Sep 11, 2012·2 cites·14 claims
- 3764US5273775AProcess for selectively depositing copper aluminum alloy onto a substrateAIR PROD & CHEM·Filed 1992·Granted Dec 28, 1993·36 cites·27 claims
- 3863US8703103B2Volatile imidazoles and group 2 imidazole based metal precursorsNORMAN JOHN ANTHONY THOMAS·Filed 2011·Granted Apr 22, 2014·1 cites·7 claims
- 3962US7524533B2Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processesAIR PROD & CHEM·Filed 2004·Granted Apr 28, 2009·6 cites·16 claims
- 4062US2013011579A1Metal-Enolate Precursors For Depositing Metal-Containing FilmsAIR PROD & CHEM·Filed 2011·Application pending·0 cites
- 4161US6319567B1Synthesis of tantalum nitrideAIR PROD & CHEM·Filed 1999·Granted Nov 20, 2001·18 cites·8 claims
- 4261US4943673ANovel metal-diketone absorbents for olefinsAIR PROD & CHEM·Filed 1988·Granted Jul 24, 1990·6 cites·9 claims
- 4358US6096913AProduction of metal-ligand complexesAIR PROD & CHEM·Filed 1999·Granted Aug 1, 2000·7 cites·22 claims
- 4457US2010119726A1Group 2 Metal Precursors For Deposition Of Group 2 Metal Oxide FilmsAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 4556US7919409B2Materials for adhesion enhancement of copper film on diffusion barriersAIR PROD & CHEM·Filed 2008·Granted Apr 5, 2011·1 cites·11 claims
- 4654US9018387B2Complexes of imidazole ligandsNORMAN JOHN ANTHONY THOMAS·Filed 2011·Granted Apr 28, 2015·0 cites·34 claims
- 4754US4877425ANovel metal-diketone absorbents for carbon monoxideAIR PROD & CHEM·Filed 1988·Granted Oct 31, 1989·4 cites·7 claims
- 4854US2008075855A1Methods For Depositing Metal Films On Diffusion Barrier Layers By CVD ProcessesAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 4954US2008254218A1Metal Precursor Solutions For Chemical Vapor DepositionAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 5053US8592606B2Liquid precursor for depositing group 4 metal containing filmsLEI XINJIAN·Filed 2010·Granted Nov 26, 2013·0 cites·17 claims
Showing the top 50 of 68 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when John Anthony Thomas Norman files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →