Inventor · disambiguated record
Motoyuki Shima
Also filed as: SHIMA MOTOYUKI
13 granted patents·5 pending applications·39 citations·filing 2003–2020
87Inventor score
Top patents by PatentIndex Score
18 records- 0191US10272478B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·7 cites·24 claims
- 0283US9818598B2Substrate cleaning method and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Nov 14, 2017·4 cites·10 claims
- 0373US10792711B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 6, 2020·1 cites·12 claims
- 0471US8927200B2Double patterning methodJSR CORP·Filed 2013·Granted Jan 6, 2015·3 cites·14 claims
- 0563US9926462B2Composition for forming liquid immersion upper layer film, and polymerJSR CORP·Filed 2016·Granted Mar 27, 2018·0 cites·15 claims
- 0661US7144675B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Dec 5, 2006·7 cites·12 claims
- 0756US6800419B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Oct 5, 2004·14 cites·19 claims
- 0854US9540535B2Composition for forming liquid immersion upper layer film, and polymerJSR CORP·Filed 2013·Granted Jan 10, 2017·0 cites·17 claims
- 0954US2014147794A1Method of forming photoresist patternJSR CORP·Filed 2014·Application pending·0 cites
- 1053US9417527B2Resist pattern-forming method, substrate-processing method, and photoresist compositionJSR CORP·Filed 2014·Granted Aug 16, 2016·0 cites·20 claims
- 1149US10023827B2Cleaning composition for semiconductor substrate and cleaning methodJSR CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 1249US2012171613A1Upper layer film-forming composition and method of forming photoresist patternSUGIE NORIHIKO·Filed 2012·Application pending·0 cites
- 1347US9817311B2Resist pattern-forming method, substrate-processing method, and photoresist compositionJSR CORP·Filed 2016·Granted Nov 14, 2017·0 cites·13 claims
- 1445US2021115221A1Composition and substrate-treating methodJSR CORP·Filed 2020·Application pending·0 cites
- 1545US2016032227A1Cleaning composition for semiconductor substrate and cleaning methodJSR CORP·Filed 2015·Application pending·0 cites
- 1639US2013084524A1Composition for forming liquid immersion upper layer film and method for forming resist patternJSR CORP·Filed 2012·Application pending·0 cites
- 1738US7078148B2Radiation sensitive resin compositionJSR CORP·Filed 2003·Granted Jul 18, 2006·3 cites·5 claims
- 1831US8501389B2Upper layer-forming composition and resist patterning methodKUSABIRAKI KAZUNORI·Filed 2011·Granted Aug 6, 2013·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →