Inventor · disambiguated record
Jae-Sung Yoon
Also filed as: YOON JAE-SUNG
7 granted patents·4 pending applications·8 citations·filing 2009–2025
76Inventor score
Files withREBELLIONS INC3SAMSUNG ELECTRONICS CO LTD2SK HYNIX INC2CHANG SUNG HWAN1INHA IND PARTNERSHIP INST1
Top patents by PatentIndex Score
11 records- 0179US9943812B2Artificial membrane-fixed liquid filtration structureINHA IND PARTNERSHIP INST·Filed 2015·Granted Apr 17, 2018·2 cites·19 claims
- 0275US12287729B2Neural processing device and method for transmitting data thereofREBELLIONS INC·Filed 2024·Granted Apr 29, 2025·0 cites·14 claims
- 0375US9502648B2Semiconductor apparatus with variable resistor having tapered double-layered sidewall spacers and method for fabricating the sameSK HYNIX INC·Filed 2014·Granted Nov 22, 2016·4 cites·6 claims
- 0473US2025225070A1Neural processing device and method for transmitting data thereofREBELLIONS INC·Filed 2025·Application pending·0 cites
- 0571US11960391B2Neural processing device and method for transmitting data thereofREBELLIONS INC·Filed 2023·Granted Apr 16, 2024·0 cites·16 claims
- 0668US10717052B2Hybrid type filtration structure for filtering liquidKOREA INST MACH & MATERIALS·Filed 2015·Granted Jul 21, 2020·1 cites·20 claims
- 0762US10714080B2WFST decoding system, speech recognition system including the same and method for storing WFST dataSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 14, 2020·1 cites·20 claims
- 0855US2025035719A1Method and apparatus with magnetic body measurementSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0947US2017040382A1Semiconductor apparatus with variable resistor having tapered double-layered sidewall spacersSK HYNIX INC·Filed 2016·Application pending·0 cites
- 1044US2011223335A1Device for forming surface pattern on fluid, and forming method thereofYOON JAE-SUNG·Filed 2009·Application pending·0 cites
- 1138US9211575B2Method of manufacturing roll for roll printing/roll imprintingCHANG SUNG HWAN·Filed 2011·Granted Dec 15, 2015·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →