Inventor · disambiguated record
Shigeru Hasebe
Also filed as: HASEBE SHIGERU
7 granted patents·3 pending applications·41 citations·filing 2000–2012
80Inventor score
Top patents by PatentIndex Score
10 records- 0175US7473495B2Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program productTOSHIBA KK·Filed 2004·Granted Jan 6, 2009·13 cites·24 claims
- 0271US7090949B2Method of manufacturing a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·14 cites·16 claims
- 0368US6333213B2Method of forming photomask and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2000·Granted Dec 25, 2001·13 cites·38 claims
- 0460US7446852B2Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program projectTOSHIBA KK·Filed 2007·Granted Nov 4, 2008·1 cites·10 claims
- 0551US7575835B2Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure methodTOSHIBA KK·Filed 2006·Granted Aug 18, 2009·0 cites·7 claims
- 0643US7118834B2Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure methodTOSHIBA KK·Filed 2004·Granted Oct 10, 2006·0 cites·13 claims
- 0740US2012192127A1Method of manufacturing semiconductor deviceUSUI SATOSHI·Filed 2012·Application pending·0 cites
- 0836US2012198404A1Defect inspection supporting apparatus and defect inspection supporting methodHASEBE SHIGERU·Filed 2012·Application pending·0 cites
- 0935US2006190875A1Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patternsARISAWA YUKIYASU·Filed 2006·Application pending·0 cites
- 1034US8336004B2Dimension assurance of mask using plurality of types of pattern ambient environmentNOJIMA SHIGEKI·Filed 2011·Granted Dec 18, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →