Inventor · disambiguated record
Seongjin Hong
Also filed as: HONG SEONGJIN
7 granted patents·10 pending applications·6 citations·filing 2018–2025
75Inventor score
Top patents by PatentIndex Score
17 records- 0187US11053440B2Silicon nitride etching composition and methodENTEGRIS INC·Filed 2019·Granted Jul 6, 2021·3 cites·20 claims
- 0281US10651045B2Compositions and methods for etching silicon nitride-containing substratesENTEGRIS INC·Filed 2018·Granted May 12, 2020·3 cites·20 claims
- 0374US11697767B2Silicon nitride etching composition and methodENTEGRIS INC·Filed 2021·Granted Jul 11, 2023·0 cites·9 claims
- 0473US2023295502A1Silicon nitride etching composition and methodENTEGRIS INC·Filed 2023·Application pending·0 cites
- 0568US2025019590A1Nitride etchant composition and methodENTEGRIS INC·Filed 2024·Application pending·0 cites
- 0663US12152187B2Nitride etchant composition and methodENTEGRIS INC·Filed 2021·Granted Nov 26, 2024·0 cites·5 claims
- 0763US2022372631A1Method for selectively removing nickel platinum materialENTEGRIS INC·Filed 2022·Application pending·0 cites
- 0863US2023030323A1Method and composition for etching molybdenumENTEGRIS INC·Filed 2022·Application pending·0 cites
- 0959US2025368893A1Selective silicon nitride etching compositions and related systems and related methodsENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1058US11492709B2Method and composition for etching molybdenumENTEGRIS INC·Filed 2021·Granted Nov 8, 2022·0 cites·17 claims
- 1154US2023383185A1Etchant composition and methodENTEGRIS INC·Filed 2023·Application pending·0 cites
- 1253US12272560B2Selective removal of metal oxide hard masksENTEGRIS INC·Filed 2021·Granted Apr 8, 2025·0 cites·11 claims
- 1353US11441229B2Method for selectively removing nickel platinum materialENTEGRIS INC·Filed 2019·Granted Sep 13, 2022·0 cites·11 claims
- 1451US2022241644A1Smart mat, terminal, system and control method thereof for interactive trainingOMOLLE INC·Filed 2021·Application pending·0 cites
- 1551US2025220132A1Cooking appliance that provides time-lapse video and controlling method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 1649US2024309272A1Composition and method for selectively etching silicon nitrideENTEGRIS INC·Filed 2024·Application pending·0 cites
- 1738US2022244813A1Key input device, smart mat including key input device, interactive fitness system and control method thereofOMOLLE INC·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →