Inventor · disambiguated record
Paul F. Petric
Also filed as: PETRIC PAUL · PETRIC PAUL F · PETRIC PAUL FRANCIS
26 granted patents·706 citations·filing 1982–2014
97Inventor score
Top patents by PatentIndex Score
26 records- 0197US4607167ACharged particle beam lithography machine incorporating localized vacuum envelopeVARIAN ASSOCIATES·Filed 1985·Granted Aug 19, 1986·112 cites·13 claims
- 0296US7714287B1Apparatus and method for obtaining topographical dark-field images in a scanning electron microscopeKLA TENCOR CORP·Filed 2008·Granted May 11, 2010·61 cites·27 claims
- 0390US4584479AEnvelope apparatus for localized vacuum processingVARIAN ASSOCIATES·Filed 1985·Granted Apr 22, 1986·83 cites·15 claims
- 0488US8253119B1Well-based dynamic pattern generatorBRODIE ALAN D·Filed 2009·Granted Aug 28, 2012·14 cites·15 claims
- 0588US6828571B1Apparatus and methods of controlling surface charge and focusKLA TENCOR TECH CORP·Filed 2003·Granted Dec 7, 2004·40 cites·28 claims
- 0683US8373144B1Quasi-annular reflective electron patterning deviceKLA TENCOR CORP·Filed 2010·Granted Feb 12, 2013·5 cites·16 claims
- 0783US6069684AElectron beam projection lithography system (EBPS)IBM·Filed 1998·Granted May 30, 2000·42 cites·18 claims
- 0883US4528451AGap control system for localized vacuum processingVARIAN ASSOCIATES·Filed 1982·Granted Jul 9, 1985·64 cites·28 claims
- 0982US4469950ACharged particle beam exposure system utilizing variable line scanVARIAN ASSOCIATES·Filed 1982·Granted Sep 4, 1984·25 cites·10 claims
- 1079US5585629AElectron beam nano-metrology systemIBM·Filed 1996·Granted Dec 17, 1996·36 cites·11 claims
- 1177US4560880AApparatus for positioning a workpiece in a localized vacuum processing systemVARIAN ASSOCIATES·Filed 1983·Granted Dec 24, 1985·49 cites·20 claims
- 1275US8642981B1Electron microscope assembly for viewing the wafer plane image of an electron beam lithography toolKLA TENCOR CORP·Filed 2013·Granted Feb 4, 2014·3 cites·39 claims
- 1372US4524261ALocalized vacuum processing apparatusVARIAN ASSOCIATES·Filed 1983·Granted Jun 18, 1985·15 cites·25 claims
- 1471US5481164AVariable axis stigmatorIBM·Filed 1994·Granted Jan 2, 1996·19 cites·14 claims
- 1569US5747814AMethod for centering a lens in a charged-particle systemIBM·Filed 1996·Granted May 5, 1998·21 cites·9 claims
- 1669US5136167AElectron beam lens and deflection system for plural-level telecentric deflectionIBM·Filed 1991·Granted Aug 4, 1992·21 cites·30 claims
- 1768US5635719AVariable curvilinear axis deflection means for particle optical lensesIBM·Filed 1996·Granted Jun 3, 1997·20 cites·16 claims
- 1866US5389858AVariable axis stigmatorIBM·Filed 1992·Granted Feb 14, 1995·16 cites·10 claims
- 1962US5793048ACurvilinear variable axis lens correction with shifted dipolesIBM·Filed 1996·Granted Aug 11, 1998·24 cites·7 claims
- 2061US5650628ASimultaneous deflections in charged-particle beamsIBM·Filed 1994·Granted Jul 22, 1997·16 cites·11 claims
- 2158US9355818B2Reflection electron beam projection lithography using an ExB separatorPETRIC PAUL F·Filed 2010·Granted May 31, 2016·1 cites·12 claims
- 2250US5530251AInductively coupled dual-stage magnetic deflection yokeIBM·Filed 1994·Granted Jun 25, 1996·7 cites·6 claims
- 2349US9715995B1Apparatus and methods for electron beam lithography using array cathodeKLA TENCOR CORP·Filed 2014·Granted Jul 25, 2017·0 cites·18 claims
- 2447US6262425B1Curvilinear axis set-up for charged particle lithographyIBM·Filed 1999·Granted Jul 17, 2001·7 cites·15 claims
- 2545US5530252AInductively coupled dual-stage magnetic deflection yokeIBM·Filed 1995·Granted Jun 25, 1996·5 cites·6 claims
- 2643US8957394B2Compact high-voltage electron gunKLA TENCOR CORP·Filed 2012·Granted Feb 17, 2015·0 cites·15 claims
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