Inventor · disambiguated record
Todd P. Lukanc
Also filed as: LUKANC TODD · LUKANC TODD P
72 granted patents·1 pending application·1,634 citations·filing 1995–2013
99Inventor score
Top patents by PatentIndex Score
73 records- 0193US7207017B1Method and system for metrology recipe generation and review and analysis of design, simulation and metrology resultsADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 17, 2007·85 cites·25 claims
- 0291US6117781AOptimized trench/via profile for damascene processingADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 12, 2000·126 cites·19 claims
- 0389US7194725B1System and method for design rule creation and selectionADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 20, 2007·57 cites·22 claims
- 0489US6309955B1Method for using a CVD organic barc as a hard mask during via etchADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 30, 2001·54 cites·10 claims
- 0588US7269804B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 11, 2007·27 cites·15 claims
- 0688US6472317B1Dual damascene arrangement for metal interconnection with low k dielectric constant materials in dielectric layersADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 29, 2002·43 cites·13 claims
- 0787US6479350B1Reduced masking step CMOS transistor formation using removable amorphous silicon sidewall spacersADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 12, 2002·46 cites·18 claims
- 0886US6117782AOptimized trench/via profile for damascene fillingADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 12, 2000·90 cites·20 claims
- 0985US6548423B1Multilayer anti-reflective coating process for integrated circuit fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 15, 2003·32 cites·20 claims
- 1085US6358856B1Bright field image reversal for contact hole patterningADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 19, 2002·34 cites·13 claims
- 1185US6312874B1Method for forming a dual damascene trench and underlying borderless via in low dielectric constant materialsADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 6, 2001·71 cites·7 claims
- 1284US6633083B2Barrier layer integrity testADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 14, 2003·33 cites·20 claims
- 1384US6350687B1Method of fabricating improved copper metallization including forming and removing passivation layer before forming capping filmADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 26, 2002·75 cites·10 claims
- 1483US7108946B1Method of lithographic image alignment for use with a dual mask exposure techniqueADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 19, 2006·23 cites·15 claims
- 1583US6615400B1Optimizing dense via arrays of shrunk integrated circuit designsADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 2, 2003·35 cites·14 claims
- 1682US7657864B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 2, 2010·5 cites·15 claims
- 1780US7313769B1Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability marginADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 25, 2007·30 cites·20 claims
- 1880US6211071B1Optimized trench/via profile for damascene fillingADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 3, 2001·59 cites·18 claims
- 1979US6383827B1Electrical alignment test structure using local interconnect ladder resistorADVANCED MICRO DEVICES INC·Filed 2000·Granted May 7, 2002·24 cites·16 claims
- 2078US6635409B1Method of strengthening photoresist to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 21, 2003·16 cites·19 claims
- 2178US6534224B2Phase shift mask and system and method for making the sameADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·13 cites·20 claims
- 2278US6121149AOptimized trench/via profile for damascene fillingADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 19, 2000·54 cites·20 claims
- 2375US8975195B2Methods for optical proximity correction in the design and fabrication of integrated circuitsGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 10, 2015·3 cites·20 claims
- 2475US7076750B1Method and apparatus for generating trenches for viasADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 11, 2006·21 cites·14 claims
- 2574US6749971B2Method of enhancing clear field phase shift masks with chrome border around phase 180 regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 15, 2004·12 cites·24 claims
- 2674US6279147B1Use of an existing product map as a background for making test masksADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 21, 2001·16 cites·25 claims
- 2773US7487492B1Method for increasing manufacturability of a circuit layoutADVANCED MICRO DEVICES INC·Filed 2006·Granted Feb 3, 2009·6 cites·18 claims
- 2873US6262435B1Etch bias distribution across semiconductor waferFiled 1998·Granted Jul 17, 2001·36 cites·6 claims
- 2972US6641747B1Method and apparatus for determining an etch endpointADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 4, 2003·9 cites·20 claims
- 3072US6156643AMethod of forming a dual damascene trench and borderless via structureADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 5, 2000·41 cites·21 claims
- 3171US6803178B1Two mask photoresist exposure pattern for dense and isolated regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 12, 2004·16 cites·35 claims
- 3271US6516450B1Variable design rule toolADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 4, 2003·21 cites·21 claims
- 3371US6184114B1MOS transistor formationADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 6, 2001·30 cites·20 claims
- 3470US6660645B1Process for etching an organic dielectric using a silyated photoresist maskADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 9, 2003·12 cites·15 claims
- 3569US6753266B1Method of enhancing gate patterning properties with reflective hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 22, 2004·12 cites·19 claims
- 3668US7015148B1Reduce line end pull back by exposing and etching space after mask one trim and etchADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 21, 2006·12 cites·17 claims
- 3768US6524947B1Slotted trench dual inlaid structure and method of forming thereofADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 25, 2003·15 cites·20 claims
- 3868US6153514ASelf-aligned dual damascene arrangement for metal interconnection with low k dielectric constant materials and nitride middle etch stop layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Nov 28, 2000·33 cites·16 claims
- 3967US6218224B1Nitride disposable spacer to reduce mask count in CMOS transistor formationADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 17, 2001·26 cites·19 claims
- 4067US6103563ANitride disposable spacer to reduce mask count in CMOS transistor formationADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 15, 2000·27 cites·17 claims
- 4166US6291887B1Dual damascene arrangements for metal interconnection with low k dielectric constant materials and nitride middle etch stop layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 18, 2001·32 cites·7 claims
- 4265US6096644ASelf-aligned contacts to source/drain silicon electrodes utilizing polysilicon and metal silicidesADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 1, 2000·21 cites·15 claims
- 4364US6528372B2Sidewall spacer definition of gatesADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 4, 2003·11 cites·29 claims
- 4463US6797438B1Method and enhancing clear field phase shift masks with border around edges of phase regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 28, 2004·6 cites·21 claims
- 4562US9064078B2Methods and systems for designing and manufacturing optical lithography masksGLOBALFOUNDRIES INC·Filed 2013·Granted Jun 23, 2015·1 cites·15 claims
- 4662US6675369B1Method of enhancing clear field phase shift masks by adding parallel line to phase 0 regionADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 6, 2004·6 cites·22 claims
- 4762US6458606B2Etch bias distribution across semiconductor waferADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 1, 2002·6 cites·18 claims
- 4861US7027130B2Device and method for determining an illumination intensity profile of an illuminator for a lithography systemADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 11, 2006·6 cites·20 claims
- 4961US6563221B1Connection structures for integrated circuits and processes for their formationADVANCED MICRO DEVICES INC·Filed 2002·Granted May 13, 2003·9 cites·17 claims
- 5060US7543256B1System and method for designing an integrated circuit deviceADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 2, 2009·6 cites·2 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →