Inventor · disambiguated record
Issey Tanaka
Also filed as: TANAKA ISSEY
13 granted patents·4 pending applications·505 citations·filing 1995–2011
94Inventor score
Top patents by PatentIndex Score
17 records- 0198US7505111B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Mar 17, 2009·140 cites·62 claims
- 0297US6366404B1Projection optical system, production method thereof, and projection exposure apparatus using itNIKON CORP·Filed 2000·Granted Apr 2, 2002·93 cites·18 claims
- 0396US7911582B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Granted Mar 22, 2011·15 cites·40 claims
- 0496US6583931B2Projection optical system, production method thereof, and projection exposure apparatus using itNIKON CORP·Filed 2001·Granted Jun 24, 2003·83 cites·12 claims
- 0592US6831731B2Projection optical system and an exposure apparatus with the projection optical systemNIKON CORP·Filed 2002·Granted Dec 14, 2004·45 cites·70 claims
- 0689US5719698ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1996·Granted Feb 17, 1998·30 cites·7 claims
- 0776US5699183ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 16, 1997·25 cites·10 claims
- 0874US6104544AExposure apparatusNIKON CORP·Filed 1997·Granted Aug 15, 2000·37 cites·84 claims
- 0969US6844915B2Optical system and exposure apparatus provided with the optical systemNIKON CORP·Filed 2002·Granted Jan 18, 2005·10 cites·8 claims
- 1061US2009015807A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Application pending·0 cites
- 1161US2011279794A1Exposure apparatus and device manufacturing methodHIRUKAWA SHIGERU·Filed 2011·Application pending·0 cites
- 1260US2011051106A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2010·Application pending·0 cites
- 1356US6710930B2Illumination optical system and method of making exposure apparatusNIKON CORP·Filed 2002·Granted Mar 23, 2004·4 cites·84 claims
- 1454US6025955AOptical member for photolithography, method for evaluating optical member, and photolithography apparatusNIKON CORP·Filed 1997·Granted Feb 15, 2000·13 cites·11 claims
- 1551USRE38465EExposure apparatusNIPPON KOGAKU KK·Filed 2001·Granted Mar 16, 2004·3 cites·190 claims
- 1644US6181469B1Optical member for photolithography, method for evaluating optical member, and photolithography apparatusNIKON CORP·Filed 1999·Granted Jan 30, 2001·7 cites·8 claims
- 1743US2005122499A1Projection optical system and an exposure apparatus with the projection optical systemNIKON CORP·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →