Exposure apparatus and device manufacturing method

Abstract

An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics.

1 . An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising:
 a source emitting electromagnetic radiation onto an object plane;   a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and   an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece, wherein the immersion medium is supplied through at least one orifice arranged in the immersion optics.   
   
   
       2 . The apparatus according to  claim 1 , wherein the source emitting electromagnetic radiation is an excimer laser. 
   
   
       3 . The apparatus according to  claim 1 , further comprising at least one immersion medium removal orifice. 
   
   
       4 . An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising:
 a source emitting electromagnetic radiation onto an object plane;   a mask adapted to receive and modulate the electromagnetic radiation at the object plane and to relay the electromagnetic radiation toward the work piece; and   an immersion medium contacting at least a portion of a final lens of the lithographic system and a portion of the work piece, wherein an area of the contacting is restricted by capillary forces.   
   
   
       5 . A lithographic apparatus, comprising:
 an illumination system configured to condition a beam of radiation;   a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;   a substrate table configured to hold a substrate;   an interferometer configured to measure positional information of the substrate table;   a projection system configured to project the patterned beam onto a target portion of the substrate;   a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and   a gas flow port configured to create a flow of gas in a space in the vicinity of the liquid so that a measurement error of the interferometer is prevented.   
   
   
       6 . The apparatus according to  claim 5 , wherein the gas flow port comprises a vacuum inlet. 
   
   
       7 . The apparatus according to  claim 6 , wherein the vacuum inlet suctions gas in the vicinity of the liquid. 
   
   
       8 . The apparatus according to  claim 5 , wherein the gas flow port comprises a passage through which the flow of gas flows. 
   
   
       9 . The apparatus according to  claim 5 , wherein the liquid supply system further comprises a liquid confinement structure extending along at least a part of the boundary of the space between the projection system and the substrate. 
   
   
       10 . A device manufacturing method, comprising:
 providing a liquid to a space between a projection system and a substrate on a substrate table;   measuring positional information of the substrate table using an interferometer;   flowing a gas in a space in the vicinity of the liquid so that a measurement error of the interferometer is prevented; and   projecting a patterned beam of radiation using the projection system onto a target portion of the substrate through the liquid.   
   
   
       11 . The method according to  claim 10 , comprising using a vacuum inlet to create the flowing gas. 
   
   
       12 . The method according to  claim 11 , comprising using the vacuum inlet to suction gas in the vicinity of the liquid. 
   
   
       13 . The method according to  claim 10 , comprising flowing the gas through a passage. 
   
   
       14 . The method according to  claim 10 , wherein providing the liquid comprises providing the liquid to the space between the projection system and the substrate using a liquid confinement structure extending along at least a part of the boundary of the space between the projection system and the substrate. 
   
   
       15 . A liquid immersion type exposure apparatus, comprising:
 an optical element; and   a liquid system configured to supply a liquid to at least a portion of a space between the optical element and an object and to recover the supplied liquid,   wherein the path for supplying the liquid and the path for recovering the liquid, of the liquid system, are interchangeable.   
   
   
       16 . An apparatus according to  claim 15 , wherein the path for supplying the liquid and the path for recovering the liquid, are interchanged in accordance with a movement direction of the object. 
   
   
       17 . An apparatus according to  claim 15 , wherein the path for supplying the liquid and/or the path for recovering the liquid, of the liquid system, extends through the inside of the optical element. 
   
   
       18 . An apparatus according to  claim 15 , wherein the object includes a substrate which is exposed with an exposure beam through the optical element and the liquid supplied from the liquid system. 
   
   
       19 . An apparatus according to  claim 18 , further comprising a projection system configured to project a pattern image onto the substrate, the optical element being arranged at the end portion of the projection system on the substrate side. 
   
   
       20 . A liquid immersion type exposure apparatus, comprising:
 an optical element; and   a liquid system configured to supply a liquid to at least a portion of a space between the optical element and an object and to recover the supplied liquid,   wherein the path for supplying the liquid and/or the path for recovering the liquid, of the liquid system, extends through the inside of the optical element.   
   
   
       21 . An apparatus according to  claim 20 , wherein the object includes a substrate which is exposed with an exposure beam through the optical element and the liquid supplied from the liquid system. 
   
   
       22 . An apparatus according to  claim 21 , further comprising a projection system configured to project a pattern image onto the substrate, the optical element being arranged at the end portion of the projection system on the substrate side. 
   
   
       23 . A device manufacturing method, comprising the step of:
 exposing a substrate by use of a liquid immersion type exposure apparatus as recited in  claim 15 .   
   
   
       24 . A device manufacturing method, comprising the step of:
 exposing a substrate by use of a liquid immersion type exposure apparatus as recited in  claim 20 .