Inventor · disambiguated record
Ja-Hyung Han
Also filed as: HAN JA-HYUNG
10 granted patents·3 pending applications·126 citations·filing 2001–2016
89Inventor score
Top patents by PatentIndex Score
13 records- 0192US9123771B2Shallow trench isolation integration methods and devices formed therebyGLOBALFOUNDRIES INC·Filed 2013·Granted Sep 1, 2015·13 cites·19 claims
- 0290US7488235B2Polishing apparatus and related polishing methodsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Feb 10, 2009·17 cites·16 claims
- 0387US7214123B2Retainer ring, Polishing head, and chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted May 8, 2007·13 cites·26 claims
- 0482US9385192B2Shallow trench isolation integration methods and devices formed therebyGLOBALFOUNDRIES INC·Filed 2015·Granted Jul 5, 2016·3 cites·7 claims
- 0582US6475914B2Method of manufacturing semiconductor device for protecting Cu layer from post chemical mechanical polishing-corrosionSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Nov 5, 2002·26 cites·18 claims
- 0678US7066785B2Polishing apparatus and related polishing methodsSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 27, 2006·21 cites·17 claims
- 0775US6596581B2Method for manufacturing a semiconductor device having a metal-insulator-metal capacitor and a damascene wiring layer structureSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 22, 2003·26 cites·38 claims
- 0860US6924234B2Method and apparatus for polishing a copper layer and method for forming a wiring structure using copperSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 2, 2005·6 cites·21 claims
- 0941US2015200111A1Planarization scheme for finfet gate height uniformity controlGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 1039US10056458B2Siloxane and organic-based MOL contact patterningGLOBALFOUNDRIES INC·Filed 2016·Granted Aug 21, 2018·0 cites·19 claims
- 1139US2003017693A1Method of manufacturing semiconductor device for protecting Cu layer from post chemical mechanical polishing-corrosion and chemical mechanical polishing equipment used in the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Application pending·0 cites
- 1236US6913972B2Method of fabrication on a gate pattern of a non-volatile memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jul 5, 2005·1 cites·17 claims
- 1335US2018130891A1Gate structuresGLOBALFOUNDRIES INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →