Inventor · disambiguated record
Kimihiro Matsuse
Also filed as: MATSUSE KIMIHIRO
18 granted patents·1 pending application·1,968 citations·filing 1989–2021
96Inventor score
Files withTOKYO ELECTRON LTD19
Top patents by PatentIndex Score
19 records- 0198US6576062B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2001·Granted Jun 10, 2003·612 cites·17 claims
- 0297US6861356B2Method of forming a barrier film and method of forming wiring structure and electrodes of semiconductor device having a barrier filmTOKYO ELECTRON LTD·Filed 2002·Granted Mar 1, 2005·245 cites·32 claims
- 0396US6454909B1Method and apparatus for forming a film on an object to be processedTOKYO ELECTRON LTD·Filed 2000·Granted Sep 24, 2002·351 cites·18 claims
- 0496US5647945AVacuum processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 15, 1997·308 cites·2 claims
- 0590US5951772AVacuum processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Sep 14, 1999·104 cites·5 claims
- 0686US6251188B1Apparatus for forming laminated thin films or layersTOKYO ELECTRON LTD·Filed 1999·Granted Jun 26, 2001·60 cites·5 claims
- 0785US6022586AMethod and apparatus for forming laminated thin films or layersTOKYO ELECTRON LTD·Filed 1998·Granted Feb 8, 2000·54 cites·11 claims
- 0884US4913790ATreating methodTOKYO ELECTRON LTD·Filed 1989·Granted Apr 3, 1990·50 cites·7 claims
- 0982US5997651AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 7, 1999·68 cites·17 claims
- 1080US7829144B2Method of forming a metal film for electrodeTOKYO ELECTRON LTD·Filed 2005·Granted Nov 9, 2010·7 cites·21 claims
- 1170US6251191B1Processing apparatus and processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Jun 26, 2001·37 cites·18 claims
- 1268US7153773B2TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming systemTOKYO ELECTRON LTD·Filed 2004·Granted Dec 26, 2006·9 cites·15 claims
- 1363US6838376B2Method of forming semiconductor wiring structuresTOKYO ELECTRON LTD·Filed 1998·Granted Jan 4, 2005·27 cites·16 claims
- 1461US6919273B1Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN filmTOKYO ELECTRON LTD·Filed 1999·Granted Jul 19, 2005·21 cites·9 claims
- 1558US2021343560A1Apparatus and method for real-time sensing of properties in industrial manufacturing equipmentTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1650US11114321B2Apparatus and method for real-time sensing of properties in industrial manufacturing equipmentTOKYO ELECTRON LTD·Filed 2018·Granted Sep 7, 2021·0 cites·21 claims
- 1745US6404021B1Laminated structure and a method of forming the sameTOKYO ELECTRON LTD·Filed 1998·Granted Jun 11, 2002·8 cites·8 claims
- 1842US6245673B1Method of forming tungsten silicide filmTOKYO ELECTRON LTD·Filed 1999·Granted Jun 12, 2001·7 cites·13 claims
- 1937US6489208B2Method of forming a laminated structure to enhance metal silicide adhesion on polycrystalline siliconTOKYO ELECTRON LTD·Filed 2002·Granted Dec 3, 2002·0 cites·37 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →