Inventor · disambiguated record
Shaunak Mukherjee
Also filed as: MUKHERJEE SHAUNAK
9 granted patents·8 pending applications·10 citations·filing 2014–2022
79Inventor score
Files withAPPLIED MATERIALS INC17
Top patents by PatentIndex Score
17 records- 0191US9508545B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2015·Granted Nov 29, 2016·6 cites·12 claims
- 0284US9741558B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2016·Granted Aug 22, 2017·3 cites·8 claims
- 0379US11594409B2Systems and methods for depositing low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2020·Granted Feb 28, 2023·1 cites·12 claims
- 0467US12198925B2Systems and methods for depositing low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2022·Granted Jan 14, 2025·0 cites·20 claims
- 0558US2019214228A1Radical assisted cure of dielectric filmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 0658US2016138161A1Radical assisted cure of dielectric filmsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 0758US2016017487A1Integrated pre-clean and deposition of low-damage layersAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 0857US10002757B2Selectively lateral growth of silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2017·Granted Jun 19, 2018·0 cites·15 claims
- 0957US2015167160A1Enabling radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 1056US11289369B2Low-k dielectric with self-forming barrier layerAPPLIED MATERIALS INC·Filed 2020·Granted Mar 29, 2022·0 cites·19 claims
- 1156US2020075321A1Non-uv high hardness low k film depositionAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1253US11393678B2Low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 19, 2022·0 cites·18 claims
- 1348US11011371B2SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure materialAPPLIED MATERIALS INC·Filed 2017·Granted May 18, 2021·0 cites·19 claims
- 1440US10790140B2High deposition rate and high quality nitrideAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·0 cites·20 claims
- 1540US2020216959A1High aspect ratio depositionAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1635US2017125241A1Low temp single precursor arc hard mask for multilayer patterning applicationAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 1734US2016017495A1Plasma-enhanced and radical-based cvd of porous carbon-doped oxide films assisted by radical curingAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →