Inventor · disambiguated record
Stefan Hunsche
Also filed as: HUNSCHE STEFAN
47 granted patents·8 pending applications·914 citations·filing 2002–2025
98Inventor score
Files withASML NETHERLANDS BV39LUCENT TECHNOLOGIES INC6BRION TECH INC5ALCATEL LUCENT USA INC1CANNON CRISTINA BARBOSA1
Top patents by PatentIndex Score
55 records- 0199US7587704B2System and method for mask verification using an individual mask error modelBRION TECH INC·Filed 2006·Granted Sep 8, 2009·483 cites·17 claims
- 0298US7694267B1Method for process window optimized optical proximity correctionBRION TECH INC·Filed 2007·Granted Apr 6, 2010·86 cites·16 claims
- 0397US7488933B2Method for lithography model calibrationBRION TECH INC·Filed 2006·Granted Feb 10, 2009·58 cites·104 claims
- 0496US11079687B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·11 cites·20 claims
- 0596US7749666B2System and method for measuring and analyzing lithographic parameters and determining optimal process correctionsASML NETHERLANDS BV·Filed 2006·Granted Jul 6, 2010·44 cites·13 claims
- 0696US7617477B2Method for selecting and optimizing exposure tool using an individual mask error modelBRION TECH INC·Filed 2006·Granted Nov 10, 2009·47 cites·14 claims
- 0795US10712672B2Method of predicting patterning defects caused by overlay errorASML NETHERLANDS BV·Filed 2017·Granted Jul 14, 2020·7 cites·21 claims
- 0895US9958791B2Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 1, 2018·8 cites·16 claims
- 0995US8832610B2Method for process window optimized optical proximity correctionASML NETHERLANDS BV·Filed 2013·Granted Sep 9, 2014·27 cites·22 claims
- 1092US10761432B2Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Sep 1, 2020·3 cites·13 claims
- 1192US10514614B2Process variability aware adaptive inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Dec 24, 2019·8 cites·20 claims
- 1291US8413081B2Method for process window optimized optical proximity correctionYE JUN·Filed 2010·Granted Apr 2, 2013·14 cites·12 claims
- 1390US11143970B2Method and apparatus for image analysisASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·2 cites·23 claims
- 1489US10732513B2Method and apparatus for image analysisASML NETHERLANDS BV·Filed 2019·Granted Aug 4, 2020·4 cites·20 claims
- 1589US10437157B2Method and apparatus for image analysisASML NETHERLANDS BV·Filed 2015·Granted Oct 8, 2019·5 cites·20 claims
- 1689US9990451B2Process window optimizerASML NETHERLANDS BV·Filed 2015·Granted Jun 5, 2018·10 cites·20 claims
- 1787US11681229B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Jun 20, 2023·1 cites·20 claims
- 1887US11238189B2Process window optimizerASML NETHERLANDS BV·Filed 2018·Granted Feb 1, 2022·3 cites·20 claims
- 1987US11003093B2Process variability aware adaptive inspection and metrologyASML NETHERLANDS BV·Filed 2019·Granted May 11, 2021·5 cites·25 claims
- 2086US11443083B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2017·Granted Sep 13, 2022·2 cites·20 claims
- 2185US2025341785A1Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 2285US2025355366A1Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 2384US10859926B2Methods for defect validationASML NETHERLANDS BV·Filed 2016·Granted Dec 8, 2020·7 cites·24 claims
- 2484US9645509B2Scanner model representation with transmission cross coefficientsCAO YU·Filed 2009·Granted May 9, 2017·7 cites·19 claims
- 2584US2025053702A1Process window optimizerASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2682US12228862B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 2781US10852646B2Displacement based overlay or alignmentASML NETHERLANDS BV·Filed 2017·Granted Dec 1, 2020·2 cites·21 claims
- 2881US2024126181A1Process window based on defect probabilityASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2980US7139478B2Nonlinear device comprising a spectrally broadening fiberFITEL USA CORP·Filed 2002·Granted Nov 21, 2006·22 cites·6 claims
- 3079US11720029B2Method and apparatus for image analysisASML NETHERLANDS BV·Filed 2021·Granted Aug 8, 2023·0 cites·20 claims
- 3178US12271114B2Method and apparatus for predicting substrate imageASML NETHERLANDS BV·Filed 2020·Granted Apr 8, 2025·1 cites·20 claims
- 3276US12141507B2Process window optimizerASML NETHERLANDS BV·Filed 2022·Granted Nov 12, 2024·0 cites·20 claims
- 3376US10908515B2Method and apparatus for pattern fidelity controlASML NETHERLANDS BV·Filed 2017·Granted Feb 2, 2021·1 cites·20 claims
- 3475US12360461B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2022·Granted Jul 15, 2025·0 cites·20 claims
- 3575US12092965B2Process variability aware adaptive inspection and metrologyASML NETHERLANDS BV·Filed 2021·Granted Sep 17, 2024·0 cites·27 claims
- 3675US11822255B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 3775US10607334B2Method and apparatus for image analysisASML NETHERLANDS BV·Filed 2015·Granted Mar 31, 2020·2 cites·20 claims
- 3874US10962886B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2016·Granted Mar 30, 2021·1 cites·20 claims
- 3972US11022900B2Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Jun 1, 2021·0 cites·20 claims
- 4069US11669020B2Method and apparatus for pattern fidelity controlASML NETHERLANDS BV·Filed 2021·Granted Jun 6, 2023·0 cites·20 claims
- 4169US6867852B2Method and apparatus for channel detectionLUCENT TECHNOLOGIES INC·Filed 2003·Granted Mar 15, 2005·10 cites·17 claims
- 4269US6859306B2Method, apparatus and system for reducing gain ripple in a raman-amplified WDM systemLUCENT TECHNOLOGIES INC·Filed 2003·Granted Feb 22, 2005·11 cites·29 claims
- 4367US12386268B2Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2021·Granted Aug 12, 2025·0 cites·20 claims
- 4467US8909038B2Method and apparatus providing transient control in optical add-drop nodesCANNON CRISTINA BARBOSA·Filed 2003·Granted Dec 9, 2014·13 cites·40 claims
- 4564US7564017B2System and method for characterizing aerial image quality in a lithography systemBRION TECH INC·Filed 2006·Granted Jul 21, 2009·1 cites·22 claims
- 4659US6819480B2Method and apparatus for controlling the extinction ratio of transmittersLUCENT TECHNOLOGIES INC·Filed 2002·Granted Nov 16, 2004·7 cites·23 claims
- 4756US12189307B2Metrology data correction using image quality metricASML NETHERLANDS BV·Filed 2019·Granted Jan 7, 2025·0 cites·20 claims
- 4852US11126093B2Focus and overlay improvement by modifying a patterning deviceASML NETHERLANDS BV·Filed 2017·Granted Sep 21, 2021·0 cites·20 claims
- 4949US2024264539A1Inspection data filtering systems and methodsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 5047US7099594B2Optical transmission using all-optical regeneration and dispersion techniquesLUCENT TECHNOLOGIES INC·Filed 2002·Granted Aug 29, 2006·1 cites·16 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →