Inventor · disambiguated record
Medhat A. Toukhy
Also filed as: TOUKHY MEDHAT · TOUKHY MEDHAT A
42 granted patents·7 pending applications·612 citations·filing 1981–2020
98Inventor score
Files withOCG MICROELECTRONIC MATERIALS20OLIN HUNT SPECIALTY PROD5HUNT CHEM CORP PHILIP A3MERCK PATENT GMBH3TOUKHY MEDHAT A3
Top patents by PatentIndex Score
49 records- 0193US6844131B2Positive-working photoimageable bottom antireflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted Jan 18, 2005·113 cites·23 claims
- 0292US4529682APositive photoresist composition with cresol-formaldehyde novolak resinsHUNT CHEM CORP PHILIP A·Filed 1982·Granted Jul 16, 1985·61 cites·9 claims
- 0392US4377631APositive novolak photoresist compositionsHUNT CHEM CORP PHILIP A·Filed 1981·Granted Mar 22, 1983·79 cites·10 claims
- 0490US5541033ASelected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Jul 30, 1996·37 cites·48 claims
- 0587US4587196APositive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazideHUNT CHEM CORP PHILIP A·Filed 1984·Granted May 6, 1986·40 cites·9 claims
- 0684US8841062B2Positive working photosensitive materialLIU WEIHONG·Filed 2012·Granted Sep 23, 2014·6 cites·20 claims
- 0784US5547814AO-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive imagesOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Aug 20, 1996·22 cites·16 claims
- 0883US9012126B2Positive photosensitive materialLIU WEIHONG·Filed 2012·Granted Apr 21, 2015·5 cites·18 claims
- 0983US8906594B2Negative-working thick film photoresistCHEN CHUNWEI·Filed 2012·Granted Dec 9, 2014·7 cites·12 claims
- 1083US4957846ARadiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Sep 18, 1990·18 cites·16 claims
- 1182US5602260ASelected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 11, 1997·19 cites·3 claims
- 1273US5164286APhotoresist developer containing fluorinated amphoteric surfactantOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Nov 17, 1992·28 cites·12 claims
- 1372US7255970B2Photoresist composition for imaging thick filmsAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Aug 14, 2007·11 cites·17 claims
- 1471US5985507ASelected high thermal novolaks and positive-working radiation-sensitive compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Nov 16, 1999·23 cites·20 claims
- 1571US4992596ASelected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixturesOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·17 cites·5 claims
- 1667US5413894AHigh ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted May 9, 1995·12 cites·15 claims
- 1766US8715918B2Thick film resistsTOUKHY MEDHAT A·Filed 2007·Granted May 6, 2014·3 cites·12 claims
- 1865US7070914B2Process for producing an image using a first minimum bottom antireflective coating compositionAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Jul 4, 2006·18 cites·25 claims
- 1964US5494785AHigh ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patternsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 27, 1996·15 cites·12 claims
- 2058US5473045AHigh ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Dec 5, 1995·14 cites·20 claims
- 2158US5177172ASelected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Jan 5, 1993·14 cites·3 claims
- 2257US5002851ALight sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol substituted trihydroxybenzophenone as reactantOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Mar 26, 1991·12 cites·14 claims
- 2353US11822242B2DNQ-type photoresist composition including alkali-soluble acrylic resinsMERCK PATENT GMBH·Filed 2020·Granted Nov 21, 2023·0 cites·19 claims
- 2453US5019478ASelected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixturesOLIN HUNT SPECIALTY PROD·Filed 1989·Granted May 28, 1991·4 cites·10 claims
- 2550US2006199103A1Process for producing an image using a first minimum bottom antireflective coating compositionNEISSER MARK O·Filed 2006·Application pending·0 cites
- 2649US2006063105A1Negative-working photoimageable bottom antireflective coatingOBERLANDER JOSEPH E·Filed 2005·Application pending·0 cites
- 2748US5278021AO-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articlesOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Jan 11, 1994·7 cites·10 claims
- 2847US2008032229A1Bottom antireflective coatingsTOUKHY MEDHAT A·Filed 2007·Application pending·0 cites
- 2945US6140026APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesARCH SPEC CHEM INC·Filed 1999·Granted Oct 31, 2000·2 cites·10 claims
- 3044US6040107APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 21, 2000·2 cites·7 claims
- 3144US4992356AProcess of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·7 cites·4 claims
- 3243US5275911ASesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixturesOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Jan 4, 1994·5 cites·10 claims
- 3342US12276909B2Novolak/DNQ based, chemically amplified photoresistMERCK PATENT GMBH·Filed 2019·Granted Apr 15, 2025·0 cites·17 claims
- 3442US2005074688A1Bottom antireflective coatingsFiled 2003·Application pending·0 cites
- 3540US2003215736A1Negative-working photoimageable bottom antireflective coatingFiled 2002·Application pending·0 cites
- 3638US11385543B2Enviromentally stable, thick film, chemically amplified resistRIDGEFIELD ACQUISITION·Filed 2017·Granted Jul 12, 2022·0 cites·21 claims
- 3737US5328806APositive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancersOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Jul 12, 1994·3 cites·6 claims
- 3837US2004265733A1Photoacid generatorsFiled 2003·Application pending·0 cites
- 3935US2007105040A1Developable undercoating composition for thick photoresist layersTOUKHY MEDHAT A·Filed 2005·Application pending·0 cites
- 4034US5316884ARadiation-sensitive compositions containing 5-indanol in the binder resin as a comonomerOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted May 31, 1994·1 cites·13 claims
- 4134US5250653APhenolic novolak resin compositions containing 5-indanol and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Oct 5, 1993·2 cites·3 claims
- 4233US12124166B2Negative resist formulation for producing undercut pattern profilesMERCK PATENT GMBH·Filed 2018·Granted Oct 22, 2024·0 cites·30 claims
- 4333US5312720AProcess of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanoneOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted May 17, 1994·2 cites·7 claims
- 4431US5254440ASelected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist imagesOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Oct 19, 1993·1 cites·7 claims
- 4531US5220073ASelected trihydroxybenzophenone compoundsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jun 15, 1993·1 cites·5 claims
- 4631US5196517ASelected trihydroxybenzophenone compounds and their use as photoactive compoundsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Mar 23, 1993·0 cites·5 claims
- 4730US5338653APhenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patternsOCG MICROELECTRONIC MATERIALS·Filed 1994·Granted Aug 16, 1994·0 cites·4 claims
- 4830US5239122ASelected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 24, 1993·0 cites·2 claims
- 4930US5219714ASelected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixturesOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jun 15, 1993·1 cites·4 claims
Join the waitlist — get patent alerts
Get an alert when Medhat A. Toukhy files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →