Inventor · disambiguated record
Li Yan Miao
Also filed as: MIAO LI · MIAO LI YAN
10 granted patents·2 pending applications·79 citations·filing 2008–2022
87Inventor score
Files withAPPLIED MATERIALS INC7BALSEANU MIHAELA1MEBARKI BENCHERKI1MICROSOFT TECHNOLOGY LICENSING LLC1SANMEN NUCLEAR POWER CO LTD1
Top patents by PatentIndex Score
12 records- 0192US8148269B2Boron nitride and boron-nitride derived materials deposition methodBALSEANU MIHAELA·Filed 2009·Granted Apr 3, 2012·22 cites·5 claims
- 0291US7972959B2Self aligned double patterning flow with non-sacrificial featuresAPPLIED MATERIALS INC·Filed 2008·Granted Jul 5, 2011·20 cites·16 claims
- 0388US8227352B2Amorphous carbon deposition method for improved stack defectivityYU HANG·Filed 2011·Granted Jul 24, 2012·13 cites·20 claims
- 0484US8084310B2Self-aligned multi-patterning for advanced critical dimension contactsMEBARKI BENCHERKI·Filed 2009·Granted Dec 27, 2011·11 cites·16 claims
- 0583US8357618B2Frequency doubling using a photo-resist template maskAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·9 cites·20 claims
- 0676US9337051B2Method for critical dimension reduction using conformal carbon filmsAPPLIED MATERIALS INC·Filed 2015·Granted May 10, 2016·2 cites·19 claims
- 0772US10014174B2Conformal strippable carbon film for line-edge-roughness reduction for advanced patterningAPPLIED MATERIALS INC·Filed 2017·Granted Jul 3, 2018·1 cites·20 claims
- 0869US9659771B2Conformal strippable carbon film for line-edge-roughness reduction for advanced patterningAPPLIED MATERIALS INC·Filed 2016·Granted May 23, 2017·1 cites·20 claims
- 0951US8349741B2Amorphous carbon deposition method for improved stack defectivityAPPLIED MATERIALS INC·Filed 2012·Granted Jan 8, 2013·0 cites·19 claims
- 1047US11881321B2Device for measuring total gas content of primary circuit of PWR nuclear powerSANMEN NUCLEAR POWER CO LTD·Filed 2021·Granted Jan 23, 2024·0 cites·10 claims
- 1147US2023297606A1Low-resource, multi-lingual transformer modelsMICROSOFT TECHNOLOGY LICENSING LLC·Filed 2022·Application pending·0 cites
- 1242US2015118832A1Methods for patterning a hardmask layer for an ion implantation processAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Li Yan Miao files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →