Inventor · disambiguated record
Yukio Kembo
Also filed as: KEMBO YUKIO
36 granted patents·3 pending applications·1,830 citations·filing 1978–2014
98Inventor score
Files withHITACHI LTD30HITACHI HIGH TECH CORP2HITACHI KENKI FINE TECH CO LTD2RENESAS TECH CORP2BABA SHUICHI1
Top patents by PatentIndex Score
39 records- 0197US7098055B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 29, 2006·36 cites·7 claims
- 0297US4475223AExposure process and systemHITACHI LTD·Filed 1982·Granted Oct 2, 1984·141 cites·11 claims
- 0396US7940383B2Method of detecting defects on an objectHITACHI LTD·Filed 2009·Granted May 10, 2011·42 cites·20 claims
- 0496US7639350B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Dec 29, 2009·25 cites·20 claims
- 0596US6411377B1Optical apparatus for defect and particle size inspectionHITACHI LTD·Filed 1999·Granted Jun 25, 2002·174 cites·29 claims
- 0696US4391511ALight exposure device and methodHITACHI LTD·Filed 1981·Granted Jul 5, 1983·153 cites·23 claims
- 0794US5274434AMethod and apparatus for inspecting foreign particles on real time basis in semiconductor mass production lineHITACHI LTD·Filed 1991·Granted Dec 28, 1993·218 cites·20 claims
- 0893US7443496B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Oct 28, 2008·16 cites·15 claims
- 0993US5463459AMethod and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication processHITACHI LTD·Filed 1993·Granted Oct 31, 1995·145 cites·39 claims
- 1093US4803712AX-ray exposure systemHITACHI LTD·Filed 1987·Granted Feb 7, 1989·73 cites·25 claims
- 1192US7037735B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2002·Granted May 2, 2006·43 cites·18 claims
- 1292US4447731AExterior view examination apparatusHITACHI LTD·Filed 1981·Granted May 8, 1984·45 cites·7 claims
- 1391US7692779B2Apparatus and method for testing defectsHITACHI LTD·Filed 2005·Granted Apr 6, 2010·12 cites·20 claims
- 1491US7177020B2Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication processRENESAS TECH CORP·Filed 2005·Granted Feb 13, 2007·15 cites·19 claims
- 1590US5233191AMethod and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production processHITACHI LTD·Filed 1991·Granted Aug 3, 1993·145 cites·14 claims
- 1690US4825453AX-ray exposure apparatusHITACHI LTD·Filed 1985·Granted Apr 25, 1989·59 cites·15 claims
- 1790US4666291ALight-exposure apparatusHITACHI LTD·Filed 1986·Granted May 19, 1987·57 cites·7 claims
- 1888US7173693B2Method for inspecting defects and an apparatus of the sameHITACHI LTD·Filed 2005·Granted Feb 6, 2007·11 cites·15 claims
- 1986US8011230B2Scanning probe microscopeHITACHI LTD·Filed 2008·Granted Sep 6, 2011·10 cites·11 claims
- 2086US6850320B2Method for inspecting defects and an apparatus for the sameHITACHI LTD·Filed 2001·Granted Feb 1, 2005·26 cites·12 claims
- 2185US7631548B2Scanning probe microscopeHITACHI LTD·Filed 2007·Granted Dec 15, 2009·10 cites·20 claims
- 2285US4213117AMethod and apparatus for detecting positions of chips on a semiconductor waferHITACHI LTD·Filed 1978·Granted Jul 15, 1980·49 cites·11 claims
- 2383US4852133AX-ray lithography apparatusHITACHI LTD·Filed 1987·Granted Jul 25, 1989·38 cites·4 claims
- 2482US5136172AMethod and apparatus for detecting photoacoustic signalHITACHI LTD·Filed 1990·Granted Aug 4, 1992·61 cites·13 claims
- 2579US7498589B2Scanning probe microscopeHITACHI KENKI FINE TECH CO LTD·Filed 2005·Granted Mar 3, 2009·8 cites·10 claims
- 2679US5083869APhotocoustic signal detecting deviceHITACHI LTD·Filed 1989·Granted Jan 28, 1992·41 cites·14 claims
- 2777US5062715AMethod and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor deviceHITACHI LTD·Filed 1990·Granted Nov 5, 1991·44 cites·19 claims
- 2876US4777641AMethod and apparatus for alignmentHITACHI LTD·Filed 1986·Granted Oct 11, 1988·27 cites·5 claims
- 2975US8844061B2Scanning probe microscopeBABA SHUICHI·Filed 2012·Granted Sep 23, 2014·3 cites·9 claims
- 3073US8342008B2Scanning probe microscopeHITACHI LTD·Filed 2008·Granted Jan 1, 2013·3 cites·7 claims
- 3173US4788577ASubstrate surface deflecting deviceHITACHI LTD·Filed 1988·Granted Nov 29, 1988·22 cites·4 claims
- 3271US6894773B2Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication processRENESAS TECH CORP·Filed 2001·Granted May 17, 2005·11 cites·27 claims
- 3370US6650409B1Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same systemHITACHI LTD·Filed 1996·Granted Nov 18, 2003·39 cites·49 claims
- 3455US7243441B2Method and apparatus for measuring depth of holes formed on a specimenHITACHI KENKI FINE TECH CO LTD·Filed 2004·Granted Jul 17, 2007·8 cites·4 claims
- 3555US4491787AFlatness measuring deviceHITACHI LTD·Filed 1981·Granted Jan 1, 1985·12 cites·7 claims
- 3654US2014298548A1Scanning probe microscopeHITACHI LTD·Filed 2014·Application pending·0 cites
- 3744US4708484AProjection alignment method and apparatusHITACHI LTD·Filed 1985·Granted Nov 24, 1987·8 cites·7 claims
- 3844US2008087820A1Probe control method for scanning probe microscopeKURENUMA TORU·Filed 2007·Application pending·0 cites
- 3940US2008245139A1Scanning probe microscope and measurement method of sameMORIMOTO TAKAFUMI·Filed 2008·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yukio Kembo files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →