Inventor · disambiguated record
Wolfgang Harnisch
Also filed as: HARNISCH WOLFGANG
9 granted patents·3 pending applications·76 citations·filing 2002–2009
86Inventor score
Files withZEISS CARL SMS GMBH3BOEHM KLAUS2ZEISS CARL SMT AG2ARNZ MICHAEL1CARL ZEISS MICROELECTRIC SYSTE1
Top patents by PatentIndex Score
12 records- 0181US7623620B2Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nmZEISS CARL SMT AG·Filed 2004·Granted Nov 24, 2009·26 cites·25 claims
- 0277US7916930B2Method and arrangement for repairing photolithography masksZEISS CARL SMS GMBH·Filed 2007·Granted Mar 29, 2011·5 cites·13 claims
- 0376US6925225B2Device for flat illumination of an object fieldCARL ZEISS MICROELECTRIC SYSTE·Filed 2002·Granted Aug 2, 2005·24 cites·3 claims
- 0460US8705838B2Method for mask inspection for mask design and mask productionBOEHM KLAUS·Filed 2006·Granted Apr 22, 2014·3 cites·18 claims
- 0558US7286284B2Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionZEISS CARL SMS GMBH·Filed 2004·Granted Oct 23, 2007·13 cites·34 claims
- 0657USRE44216EMicroscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionTOTZECK MICHAEL·Filed 2009·Granted May 14, 2013·0 cites·35 claims
- 0754US7525115B2Arrangement for inspecting objects, especially masks in microlithographyZEISS CARL SMS GMBH·Filed 2004·Granted Apr 28, 2009·3 cites·6 claims
- 0849US8731273B2Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by sectionARNZ MICHAEL·Filed 2009·Granted May 20, 2014·0 cites·26 claims
- 0943US7167310B2Microscope, especially microscope used for inspection in semiconductor manufactureZEISS CARL JENA GMBH·Filed 2004·Granted Jan 23, 2007·2 cites·8 claims
- 1039US2006028706A1Polarizer device for generating a defined spatial distribution of polarization statesZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1133US2006154150A1Arrangement for the production of photomasksENGEL THOMAS·Filed 2003·Application pending·0 cites
- 1232US2006291031A1Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devicesBOEHM KLAUS·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →