Inventor · disambiguated record
Antonius Theodorus Wilhelmus Kempen
Also filed as: KEMPEN ANTONIUS T W · KEMPEN ANTONIUS THEODORUS · KEMPEN ANTONIUS THEODORUS WILHELMUS
19 granted patents·4 pending applications·26 citations·filing 2005–2023
90Inventor score
Files withASML NETHERLANDS BV12KEMPEN ANTONIUS THEODORUS WILHELMUS4HULTERMANS RONALD JOHANNES1KEMPEN ANTONIUS T W1LABETSKI DZMITRY1
Top patents by PatentIndex Score
23 records- 0191US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0284US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 0384US9442380B2Method and apparatus for generating radiationASML NETHERLANDS BV·Filed 2013·Granted Sep 13, 2016·4 cites·15 claims
- 0478US7667820B2Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the sameASML NETHERLANDS BV·Filed 2006·Granted Feb 23, 2010·5 cites·12 claims
- 0572US9013679B2Collector mirror assembly and method for producing extreme ultraviolet radiationLABETSKI DZMITRY·Filed 2011·Granted Apr 21, 2015·2 cites·16 claims
- 0669US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0765US9983482B2Radiation collector, radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted May 29, 2018·2 cites·18 claims
- 0865US9164403B2Radiation source, lithographic apparatus and device manufacturing methodKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2010·Granted Oct 20, 2015·1 cites·16 claims
- 0961US8685632B2Radiation source, lithographic apparatus and device manufacturing methodKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2009·Granted Apr 1, 2014·1 cites·5 claims
- 1056US12099306B2Method for controlling a lithographic systemASML NETHERLANDS BV·Filed 2020·Granted Sep 24, 2024·0 cites·12 claims
- 1155US9119280B2Radiation sourceKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2011·Granted Aug 25, 2015·1 cites·15 claims
- 1252US9860966B2Radiation sourceASML NETHERLANDS BV·Filed 2013·Granted Jan 2, 2018·0 cites·18 claims
- 1352US9510432B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·0 cites·20 claims
- 1451US8890099B2Radiation source and method for lithographic apparatus for device manufactureHULTERMANS RONALD JOHANNES·Filed 2012·Granted Nov 18, 2014·2 cites·20 claims
- 1548US9655222B2Radiation sourceVAN DEN AKKER JEROEN·Filed 2012·Granted May 16, 2017·2 cites·20 claims
- 1648US8446560B2Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing methodMOORS JOHANNES HUBERTUS JOSEPHINA·Filed 2009·Granted May 21, 2013·0 cites·7 claims
- 1747US2008218709A1Removal of deposition on an element of a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1845US9462667B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Oct 4, 2016·0 cites·20 claims
- 1945US2009025750A1Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a deviceASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 2036US9329503B2Multilayer mirrorTIMOSHKOV VADIM IOURIEVICH·Filed 2011·Granted May 3, 2016·0 cites·16 claims
- 2136US8865254B2Method for applying a material onto a substrate using a droplet printing techniqueKEMPEN ANTONIUS T W·Filed 2005·Granted Oct 21, 2014·0 cites·9 claims
- 2235US9192039B2Radiation sourceKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2012·Granted Nov 17, 2015·0 cites·12 claims
- 2329US2012006258A1Hydrogen radical generatorSCHASFOORT GERARD FRANS JOZEF·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Antonius Theodorus Wilhelmus Kempen files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →