Inventor · disambiguated record
Alexander Paterson
Also filed as: PATERSON ALEXANDER · PATERSON ALEXANDER M · PATERSON ALEXANDER MILLER
53 granted patents·43 pending applications·823 citations·filing 2001–2025
98Inventor score
Top patents by PatentIndex Score
96 records- 0198US10410836B2Systems and methods for tuning to reduce reflected power in multiple statesLAM RES CORP·Filed 2018·Granted Sep 10, 2019·30 cites·20 claims
- 0297US9053908B2Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etchingLAM RES CORP·Filed 2013·Granted Jun 9, 2015·56 cites·20 claims
- 0397US7718538B2Pulsed-plasma system with pulsed sample bias for etching semiconductor substratesAPPLIED MATERIALS INC·Filed 2007·Granted May 18, 2010·109 cites·9 claims
- 0497US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 0597US6617794B2Method for controlling etch uniformityAPPLIED MATERIALS INC·Filed 2001·Granted Sep 9, 2003·87 cites·31 claims
- 0696US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 0795US10515781B1Direct drive RF circuit for substrate processing systemsLAM RES CORP·Filed 2018·Granted Dec 24, 2019·13 cites·19 claims
- 0895US6962644B2Tandem etch chamber plasma processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Nov 8, 2005·108 cites·35 claims
- 0994US6706138B2Adjustable dual frequency voltage dividing plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Mar 16, 2004·56 cites·12 claims
- 1093US10847345B2Direct drive RF circuit for substrate processing systemsLAM RES CORP·Filed 2019·Granted Nov 24, 2020·7 cites·8 claims
- 1193US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 1293US7737042B2Pulsed-plasma system for etching semiconductor structuresAPPLIED MATERIALS INC·Filed 2007·Granted Jun 15, 2010·23 cites·9 claims
- 1392US7771606B2Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structuresAPPLIED MATERIALS INC·Filed 2007·Granted Aug 10, 2010·22 cites·18 claims
- 1492US7674394B2Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distributionAPPLIED MATERIALS INC·Filed 2007·Granted Mar 9, 2010·17 cites·21 claims
- 1592US7510665B2Plasma generation and control using dual frequency RF signalsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 31, 2009·17 cites·19 claims
- 1691US10957521B2Image based plasma sheath profile detection on plasma processing toolsLAM RES CORP·Filed 2018·Granted Mar 23, 2021·6 cites·10 claims
- 1791US10541168B2Edge ring centering method using ring dynamic alignment dataLAM RES CORP·Filed 2017·Granted Jan 21, 2020·9 cites·19 claims
- 1889US8066895B2Method to control uniformity using tri-zone showerheadBELEN RODOLFO P·Filed 2008·Granted Nov 29, 2011·18 cites·23 claims
- 1988US10262867B2Fast-gas switching for etchingLAM RES CORP·Filed 2016·Granted Apr 16, 2019·4 cites·19 claims
- 2088US7832354B2Cathode liner with wafer edge gas injection in a plasma reactor chamberAPPLIED MATERIALS INC·Filed 2007·Granted Nov 16, 2010·13 cites·17 claims
- 2186US7777152B2High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuckAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·26 cites·15 claims
- 2283US12494345B2Pulsing RF coils of a plasma chamber in reverse synchronizationLAM RES CORP·Filed 2021·Granted Dec 9, 2025·1 cites·20 claims
- 2383US10163610B2Extreme edge sheath and wafer profile tuning through edge-localized ion trajectory control and plasma operationLAM RES CORP·Filed 2016·Granted Dec 25, 2018·3 cites·21 claims
- 2483US8440473B2Use of spectrum to synchronize RF switching with gas switching during etchXU QING·Filed 2011·Granted May 14, 2013·6 cites·19 claims
- 2583US8236133B2Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension biasKATZ DAN·Filed 2008·Granted Aug 7, 2012·13 cites·9 claims
- 2683US7879250B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·7 cites·8 claims
- 2782US8475625B2Apparatus for etching high aspect ratio featuresPAMARTHY SHARMA·Filed 2006·Granted Jul 2, 2013·15 cites·22 claims
- 2881US11887819B2Systems for cooling RF heated chamber componentsLAM RES CORP·Filed 2022·Granted Jan 30, 2024·0 cites·17 claims
- 2981US2025079121A1Dual-frequency, direct-drive inductively coupled plasma sourceLAM RES CORP·Filed 2024·Application pending·0 cites
- 3080US2025345945A1Substrate location detection and adjustmentLAM RES CORP·Filed 2025·Application pending·0 cites
- 3179US7727413B2Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Granted Jun 1, 2010·5 cites·14 claims
- 3277US10879044B2Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsingLAM RES CORP·Filed 2018·Granted Dec 29, 2020·2 cites·15 claims
- 3377US2025273447A1Protection system for switches in direct drive circuits of substrate processing systemsLAM RES CORP·Filed 2025·Application pending·0 cites
- 3475US12482634B2Symmetric coupling of coil to direct-drive radiofrequency power suppliesLAM RES CORP·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 3575US2025253132A1Method and System for Automated Frequency Tuning of Radiofrequency (RF) Signal Generator for Multi-Level RF Power PulsingLAM RES CORP·Filed 2025·Application pending·0 cites
- 3675US2024355636A1Selective silicon dioxide removal using low pressure low bias deuterium plasmaLAM RES CORP·Filed 2024·Application pending·0 cites
- 3773US11495441B2Systems for cooling RF heated chamber componentsLAM RES CORP·Filed 2020·Granted Nov 8, 2022·0 cites·20 claims
- 3872US12261029B2Protection system for switches in direct drive circuits of substrate processing systemsLAM RES CORP·Filed 2021·Granted Mar 25, 2025·0 cites·24 claims
- 3972US12119232B2Etching isolation features and dense features within a substrateLAM RES CORP·Filed 2022·Granted Oct 15, 2024·0 cites·20 claims
- 4072US11728137B2Direct frequency tuning for matchless plasma source in substrate processing systemsLAM RES CORP·Filed 2019·Granted Aug 15, 2023·1 cites·16 claims
- 4171US8383002B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·2 cites·6 claims
- 4270US10249511B2Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatusLAM RES CORP·Filed 2014·Granted Apr 2, 2019·2 cites·8 claims
- 4369US12046450B2Synchronization of RF generatorsLAM RES CORP·Filed 2021·Granted Jul 23, 2024·0 cites·20 claims
- 4469US11011351B2Monoenergetic ion generation for controlled etchLAM RES CORP·Filed 2018·Granted May 18, 2021·1 cites·13 claims
- 4568US12165841B2Dual-frequency, direct-drive inductively coupled plasma sourceLAM RES CORP·Filed 2020·Granted Dec 10, 2024·0 cites·11 claims
- 4667US9275869B2Fast-gas switching for etchingLAM RES CORP·Filed 2013·Granted Mar 1, 2016·1 cites·16 claims
- 4767US2023121097A1Multi-zone cooling of plasma heated windowLAM RES CORP·Filed 2022·Application pending·0 cites
- 4866US7838430B2Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 23, 2010·8 cites·27 claims
- 4965US12057319B2Selective silicon dioxide removal using low pressure low bias deuterium plasmaLAM RES CORP·Filed 2020·Granted Aug 6, 2024·0 cites·13 claims
- 5063US12322579B2Metal contamination reduction in substrate processing systems with transformer coupled plasmaLAM RES CORP·Filed 2021·Granted Jun 3, 2025·0 cites·12 claims
Showing the top 50 of 96 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Alexander Paterson files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →