Inventor · disambiguated record
Elmar Platzgummer
Also filed as: PLATZGUMMER ELMAR
51 granted patents·13 pending applications·3,052 citations·filing 1999–2025
99Inventor score
Files withIMS NANOFABRICATION GMBH22IMS NANOFABRICATION AG20PLATZGUMMER ELMAR8ZEISS CARL SMS GMBH5FRAGNER HEINRICH2
Top patents by PatentIndex Score
64 records- 0199US8115183B2Method for maskless particle-beam exposurePLATZGUMMER ELMAR·Filed 2010·Granted Feb 14, 2012·73 cites·7 claims
- 0298US9053906B2Method for charged-particle multi-beam exposureIMS NANOFABRICATION AG·Filed 2014·Granted Jun 9, 2015·44 cites·18 claims
- 0398US8546767B2Pattern definition device with multiple multibeam arrayPLATZGUMMER ELMAR·Filed 2010·Granted Oct 1, 2013·58 cites·13 claims
- 0498US8378320B2Method for multi-beam exposure on a targetIMS NANOFABRICATION AG·Filed 2011·Granted Feb 19, 2013·50 cites·17 claims
- 0598US7781748B2Particle-beam exposure apparatus with overall-modulation of a patterned beamIMS NANOFABRICATION AG·Filed 2007·Granted Aug 24, 2010·54 cites·13 claims
- 0698US7777201B2Method for maskless particle-beam exposureIMS NANOFABRICATION AG·Filed 2008·Granted Aug 17, 2010·94 cites·22 claims
- 0798US7388217B2Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2007·Granted Jun 17, 2008·1.5k cites·9 claims
- 0897US9520268B2Compensation of imaging deviations in a particle-beam writer using a convolution kernelIMS NANOFABRICATION AG·Filed 2015·Granted Dec 13, 2016·25 cites·16 claims
- 0997US9443699B2Multi-beam tool for cutting patternsIMS NANOFABRICATION AG·Filed 2015·Granted Sep 13, 2016·27 cites·19 claims
- 1097US9373482B2Customizing a particle-beam writer using a convolution kernelIMS NANOFABRICATION AG·Filed 2015·Granted Jun 21, 2016·22 cites·16 claims
- 1197US8198601B2Method for producing a multi-beam deflector array device having electrodesPLATZGUMMER ELMAR·Filed 2010·Granted Jun 12, 2012·54 cites·20 claims
- 1297US8183543B2Multi-beam sourcePLATZGUMMER ELMAR·Filed 2008·Granted May 22, 2012·40 cites·45 claims
- 1397US6768125B2Maskless particle-beam system for exposing a pattern on a substrateIMS NANOFABRICATION GMBH·Filed 2003·Granted Jul 27, 2004·186 cites·21 claims
- 1496US10325756B2Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writerIMS NANOFABRICATION GMBH·Filed 2017·Granted Jun 18, 2019·8 cites·19 claims
- 1596US9799487B2Bi-directional double-pass multi-beam writingIMS NANOFABRICATION AG·Filed 2016·Granted Oct 24, 2017·15 cites·16 claims
- 1696US9099277B2Pattern definition device having multiple blanking arraysIMS NANOFABRICATION AG·Filed 2014·Granted Aug 4, 2015·24 cites·12 claims
- 1796US7714298B2Pattern definition device having distinct counter-electrode array plateIMS NANOFABRICATION AG·Filed 2008·Granted May 11, 2010·30 cites·20 claims
- 1896US7276714B2Advanced pattern definition for particle-beam processingIMS NANOFABRICATION GMBH·Filed 2005·Granted Oct 2, 2007·105 cites·19 claims
- 1995US9495499B2Compensation of dose inhomogeneity using overlapping exposure spotsIMS NANOFABRICATION AG·Filed 2015·Granted Nov 15, 2016·33 cites·16 claims
- 2095US8563942B2Multi-beam deflector array means with bonded electrodesPLATZGUMMER ELMAR·Filed 2010·Granted Oct 22, 2013·26 cites·16 claims
- 2194US8258488B2Compensation of dose inhomogeneity and image distortionPLATZGUMMER ELMAR·Filed 2009·Granted Sep 4, 2012·28 cites·14 claims
- 2294US8222621B2Method for maskless particle-beam exposureFRAGNER HEINRICH·Filed 2009·Granted Jul 17, 2012·70 cites·9 claims
- 2394US7214951B2Charged-particle multi-beam exposure apparatusIMS NANOFABRICATION GMBH·Filed 2004·Granted May 8, 2007·53 cites·23 claims
- 2493US10522329B2Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatusIMS NANOFABRICATION GMBH·Filed 2018·Granted Dec 31, 2019·13 cites·14 claims
- 2593US9568907B2Correction of short-range dislocations in a multi-beam writerIMS NANOFABRICATION AG·Filed 2015·Granted Feb 14, 2017·18 cites·16 claims
- 2693US8304749B2Charged-particle exposure apparatus with electrostatic zone platePLATZGUMMER ELMAR·Filed 2006·Granted Nov 6, 2012·25 cites·20 claims
- 2793US6858118B2Apparatus for enhancing the lifetime of stencil masksIMS IONEN MIKROFAB SYST·Filed 2003·Granted Feb 22, 2005·52 cites·12 claims
- 2892US10410831B2Multi-beam writing using inclined exposure stripesIMS NANOFABRICATION GMBH·Filed 2016·Granted Sep 10, 2019·7 cites·12 claims
- 2992US9653263B2Multi-beam writing of pattern areas of relaxed critical dimensionIMS NANOFABRICATION AG·Filed 2016·Granted May 16, 2017·21 cites·14 claims
- 3092US9269543B2Compensation of defective beamlets in a charged-particle multi-beam exposure toolIMS NANOFABRICATION AG·Filed 2015·Granted Feb 23, 2016·30 cites·10 claims
- 3191US7687783B2Multi-beam deflector array device for maskless particle-beam processingIMS NANOFABRICATION AG·Filed 2008·Granted Mar 30, 2010·34 cites·27 claims
- 3291US7368738B2Advanced pattern definition for particle-beam exposureZEISS CARL SMS GMBH·Filed 2005·Granted May 6, 2008·40 cites·33 claims
- 3390US10651010B2Non-linear dose- and blur-dependent edge placement correctionIMS NANOFABRICATION GMBH·Filed 2019·Granted May 12, 2020·7 cites·10 claims
- 3490US7598499B2Charged-particle exposure apparatusIMS NANOFABRICATIONS AG·Filed 2007·Granted Oct 6, 2009·20 cites·14 claims
- 3589US8026495B2Charged particle beam exposure systemZEISS CARL SMS GMBH·Filed 2005·Granted Sep 27, 2011·11 cites·17 claims
- 3688US10840054B2Charged-particle source and method for cleaning a charged-particle source using back-sputteringIMS NANOFABRICATION GMBH·Filed 2019·Granted Nov 17, 2020·7 cites·22 claims
- 3787US12040157B2Pattern data processing for programmable direct-write apparatusIMS NANOFABRICATION GMBH·Filed 2022·Granted Jul 16, 2024·2 cites·15 claims
- 3887US10325757B2Advanced dose-level quantization of multibeam-writersIMS NANOFABRICATION GMBH·Filed 2018·Granted Jun 18, 2019·9 cites·10 claims
- 3987US7737422B2Charged-particle exposure apparatusIMS NANOFABRICATION AG·Filed 2006·Granted Jun 15, 2010·11 cites·15 claims
- 4087US7033647B2Method of synthesising carbon nano tubesIMS IONEN MIKROFABRIKATIONAS S·Filed 2002·Granted Apr 25, 2006·37 cites·28 claims
- 4186US8368030B2Charged particle beam exposure system and beam manipulating arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Feb 5, 2013·9 cites·18 claims
- 4285US9093201B2High-voltage insulation device for charged-particle optical apparatusIMS NANOFABRICATION AG·Filed 2014·Granted Jul 28, 2015·20 cites·16 claims
- 4383US12154756B2Beam pattern device having beam absorber structureIMS NANOFABRICATION GMBH·Filed 2022·Granted Nov 26, 2024·1 cites·13 claims
- 4481US8278635B2Global point spreading function in multi-beam patterningPLATZGUMMER ELMAR·Filed 2010·Granted Oct 2, 2012·5 cites·10 claims
- 4581US8057972B2Constant current multi-beam patterningFRAGNER HEINRICH·Filed 2009·Granted Nov 15, 2011·25 cites·9 claims
- 4679US8368015B2Particle-optical systemZEISS CARL SMS GMBH·Filed 2006·Granted Feb 5, 2013·10 cites·24 claims
- 4779US6989546B2Particle multibeam lithographyIMS INNENMIKROFABRIKATIONS SYS·Filed 1999·Granted Jan 24, 2006·40 cites·29 claims
- 4876US11569064B2Method for irradiating a target using restricted placement gridsIMS NANOFABRICATION GMBH·Filed 2018·Granted Jan 31, 2023·2 cites·22 claims
- 4976US6909103B2Ion irradiation of a target at very high and very low kinetic ion energiesIMS IONEN MIKROFAB SYST·Filed 2004·Granted Jun 21, 2005·12 cites·11 claims
- 5076US2025349507A1Controlling the Relative Position of a Moveable Target and Charged-Particle Beams in a Multi-Column Exposure ApparatusIMS NANOFABRICATION GMBH·Filed 2025·Application pending·0 cites
Showing the top 50 of 64 patent records by PatentIndex Score.
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