Assignee
IMS NANOFABRICATION GMBH
AT·20 granted patents·13 pending applications·1,994 citations·filing 2003–2025
Top patents by PatentIndex Score
33 records- 0198US7388217B2Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2007·Granted Jun 17, 2008·1.5k cites·9 claims
- 0297US6768125B2Maskless particle-beam system for exposing a pattern on a substrateIMS NANOFABRICATION GMBH·Filed 2003·Granted Jul 27, 2004·186 cites·21 claims
- 0396US10325756B2Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writerIMS NANOFABRICATION GMBH·Filed 2017·Granted Jun 18, 2019·8 cites·19 claims
- 0496US7276714B2Advanced pattern definition for particle-beam processingIMS NANOFABRICATION GMBH·Filed 2005·Granted Oct 2, 2007·105 cites·19 claims
- 0594US7214951B2Charged-particle multi-beam exposure apparatusIMS NANOFABRICATION GMBH·Filed 2004·Granted May 8, 2007·53 cites·23 claims
- 0693US10522329B2Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatusIMS NANOFABRICATION GMBH·Filed 2018·Granted Dec 31, 2019·13 cites·14 claims
- 0793US7084411B2Pattern-definition device for maskless particle-beam exposure apparatusIMS NANOFABRICATION GMBH·Filed 2004·Granted Aug 1, 2006·90 cites·19 claims
- 0892US10410831B2Multi-beam writing using inclined exposure stripesIMS NANOFABRICATION GMBH·Filed 2016·Granted Sep 10, 2019·7 cites·12 claims
- 0990US10651010B2Non-linear dose- and blur-dependent edge placement correctionIMS NANOFABRICATION GMBH·Filed 2019·Granted May 12, 2020·7 cites·10 claims
- 1089US11099482B2Adapting the duration of exposure slots in multi-beam writersIMS NANOFABRICATION GMBH·Filed 2020·Granted Aug 24, 2021·3 cites·15 claims
- 1188US10840054B2Charged-particle source and method for cleaning a charged-particle source using back-sputteringIMS NANOFABRICATION GMBH·Filed 2019·Granted Nov 17, 2020·7 cites·22 claims
- 1287US12040157B2Pattern data processing for programmable direct-write apparatusIMS NANOFABRICATION GMBH·Filed 2022·Granted Jul 16, 2024·2 cites·15 claims
- 1387US10325757B2Advanced dose-level quantization of multibeam-writersIMS NANOFABRICATION GMBH·Filed 2018·Granted Jun 18, 2019·9 cites·10 claims
- 1486US7199373B2Particle-optic electrostatic lensIMS NANOFABRICATION GMBH·Filed 2004·Granted Apr 3, 2007·27 cites·10 claims
- 1584US11735391B2Charged-particle sourceIMS NANOFABRICATION GMBH·Filed 2021·Granted Aug 22, 2023·2 cites·20 claims
- 1683US12154756B2Beam pattern device having beam absorber structureIMS NANOFABRICATION GMBH·Filed 2022·Granted Nov 26, 2024·1 cites·13 claims
- 1776US11569064B2Method for irradiating a target using restricted placement gridsIMS NANOFABRICATION GMBH·Filed 2018·Granted Jan 31, 2023·2 cites·22 claims
- 1876US2025349507A1Controlling the Relative Position of a Moveable Target and Charged-Particle Beams in a Multi-Column Exposure ApparatusIMS NANOFABRICATION GMBH·Filed 2025·Application pending·0 cites
- 1971US7436120B2Compensation of magnetic fieldsIMS NANOFABRICATION GMBH·Filed 2005·Granted Oct 14, 2008·8 cites·22 claims
- 2065US2025391634A1Lithography SystemIMS NANOFABRICATION GMBH·Filed 2025·Application pending·0 cites
- 2164US2024304407A1Device and Method for Calibrating a Charged-Particle BeamIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 2259US2024427254A1Determination of Imaging Transfer Function of a Charged-Particle Exposure Apparatus Using Isofocal Dose MeasurementsIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 2359US2024304415A1Method for Determining Focal Properties in a Target Beam Field of a Multi-Beam Charged-Particle Processing ApparatusIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 2459US2025349508A1Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure ApparatusIMS NANOFABRICATION GMBH·Filed 2025·Application pending·0 cites
- 2557US2023296989A1Correction of Thermal Expansion in a Lithographic DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 2654US2023360880A1Multi-Beam Pattern Definition DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 2753US2024212970A1Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagnetic ComponentsIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 2853US2024304413A1Optimizing Image Distortion in a Multi Beam Charged Particle Processing ApparatusIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 2951US2023360878A1Adjustable Permanent Magnetic Lens Having Shunting DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 3051US2005201246A1Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2005·Application pending·0 cites
- 3148US12481214B2Correction of blur variation in a multi-beam writerIMS NANOFABRICATION GMBH·Filed 2021·Granted Nov 25, 2025·0 cites·20 claims
- 3243US2024021403A1Adjustable Permanent Magnetic Lens Having Thermal Control DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 3342US12500060B2Electromagnetic lensIMS NANOFABRICATION GMBH·Filed 2022·Granted Dec 16, 2025·0 cites·15 claims
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