Assignee
IMS NANOFABRICATION AG
AT·19 granted patents·2 pending applications·584 citations·filing 2005–2016
Top patents by PatentIndex Score
21 records- 0198US9053906B2Method for charged-particle multi-beam exposureIMS NANOFABRICATION AG·Filed 2014·Granted Jun 9, 2015·44 cites·18 claims
- 0298US8378320B2Method for multi-beam exposure on a targetIMS NANOFABRICATION AG·Filed 2011·Granted Feb 19, 2013·50 cites·17 claims
- 0398US7781748B2Particle-beam exposure apparatus with overall-modulation of a patterned beamIMS NANOFABRICATION AG·Filed 2007·Granted Aug 24, 2010·54 cites·13 claims
- 0498US7777201B2Method for maskless particle-beam exposureIMS NANOFABRICATION AG·Filed 2008·Granted Aug 17, 2010·94 cites·22 claims
- 0597US9520268B2Compensation of imaging deviations in a particle-beam writer using a convolution kernelIMS NANOFABRICATION AG·Filed 2015·Granted Dec 13, 2016·25 cites·16 claims
- 0697US9443699B2Multi-beam tool for cutting patternsIMS NANOFABRICATION AG·Filed 2015·Granted Sep 13, 2016·27 cites·19 claims
- 0797US9373482B2Customizing a particle-beam writer using a convolution kernelIMS NANOFABRICATION AG·Filed 2015·Granted Jun 21, 2016·22 cites·16 claims
- 0896US9799487B2Bi-directional double-pass multi-beam writingIMS NANOFABRICATION AG·Filed 2016·Granted Oct 24, 2017·15 cites·16 claims
- 0996US9099277B2Pattern definition device having multiple blanking arraysIMS NANOFABRICATION AG·Filed 2014·Granted Aug 4, 2015·24 cites·12 claims
- 1096US7714298B2Pattern definition device having distinct counter-electrode array plateIMS NANOFABRICATION AG·Filed 2008·Granted May 11, 2010·30 cites·20 claims
- 1195US9495499B2Compensation of dose inhomogeneity using overlapping exposure spotsIMS NANOFABRICATION AG·Filed 2015·Granted Nov 15, 2016·33 cites·16 claims
- 1294US7772574B2Pattern lock system for particle-beam exposure apparatusIMS NANOFABRICATION AG·Filed 2005·Granted Aug 10, 2010·32 cites·8 claims
- 1393US9568907B2Correction of short-range dislocations in a multi-beam writerIMS NANOFABRICATION AG·Filed 2015·Granted Feb 14, 2017·18 cites·16 claims
- 1492US9653263B2Multi-beam writing of pattern areas of relaxed critical dimensionIMS NANOFABRICATION AG·Filed 2016·Granted May 16, 2017·21 cites·14 claims
- 1592US9269543B2Compensation of defective beamlets in a charged-particle multi-beam exposure toolIMS NANOFABRICATION AG·Filed 2015·Granted Feb 23, 2016·30 cites·10 claims
- 1691US7687783B2Multi-beam deflector array device for maskless particle-beam processingIMS NANOFABRICATION AG·Filed 2008·Granted Mar 30, 2010·34 cites·27 claims
- 1787US7737422B2Charged-particle exposure apparatusIMS NANOFABRICATION AG·Filed 2006·Granted Jun 15, 2010·11 cites·15 claims
- 1885US9093201B2High-voltage insulation device for charged-particle optical apparatusIMS NANOFABRICATION AG·Filed 2014·Granted Jul 28, 2015·20 cites·16 claims
- 1951US7763851B2Particle-beam apparatus with improved wien-type filterIMS NANOFABRICATION AG·Filed 2007·Granted Jul 27, 2010·0 cites·9 claims
- 2048US2015069260A1Charged-particle multi-beam apparatus having correction plateIMS NANOFABRICATION AG·Filed 2014·Application pending·0 cites
- 2135US2015311031A1Multi-Beam Tool for Cutting PatternsIMS NANOFABRICATION AG·Filed 2015·Application pending·0 cites
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