Inventor · disambiguated record
Peter Deufel
Also filed as: DEUFEL PETER
10 granted patents·5 pending applications·23 citations·filing 2004–2020
84Inventor score
Top patents by PatentIndex Score
15 records- 0197US11003088B2Method and device for the correction of imaging defectsZEISS CARL SMT GMBH·Filed 2020·Granted May 11, 2021·6 cites·20 claims
- 0290US7724351B2Lithographic apparatus, device manufacturing method and exchangeable optical elementASML NETHERLANDS BV·Filed 2006·Granted May 25, 2010·12 cites·34 claims
- 0377US8159648B2Method and device for the correction of imaging defectsSORG FRANZ·Filed 2008·Granted Apr 17, 2012·3 cites·8 claims
- 0469US10620543B2Method and device for the correction of imaging defectsZEISS CARL SMT GMBH·Filed 2019·Granted Apr 14, 2020·0 cites·16 claims
- 0558US2016026094A1Method and device for the correction of imaging defectsZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 0655US9551944B2Method for replacing objective partsZEISS CARL SMT GMBH·Filed 2014·Granted Jan 24, 2017·0 cites·20 claims
- 0755US7986472B2Optical element moduleZEISS CARL SMT AG·Filed 2006·Granted Jul 26, 2011·1 cites·38 claims
- 0855US2012176591A1Method and device for the correction of imaging defectsSORG FRANZ·Filed 2012·Application pending·0 cites
- 0954US10108094B2Projection exposure apparatus with near-field manipulatorZEISS CARL SMT GMBH·Filed 2016·Granted Oct 23, 2018·0 cites·22 claims
- 1048US10571813B2Connection arrangement for a force-fit connection between ceramic componentsZEISS CARL SMT GMBH·Filed 2017·Granted Feb 25, 2020·0 cites·20 claims
- 1148US2009260654A1Method and device for replacing objective partsZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1244US2011216428A1Housing structureZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
- 1340US2008073596A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1438US8018664B2Housing structureZEISS CARL SMT GMBH·Filed 2004·Granted Sep 13, 2011·1 cites·14 claims
- 1535US9298111B2Optical arrangement in a projection exposure apparatus for EUV lithographyKULITZKI VIKTOR·Filed 2012·Granted Mar 29, 2016·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →