Method and device for the correction of imaging defects

Abstract

The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

1 .- 53 . (canceled) 
     
     
         54 . A system, comprising:
 a holding frame;   a first optical corrective element held by the holding frame; and   a second optical corrective element held by the holding frame so that the second optical corrective element is replaceable and so that the second optical corrective element is manipulable,   wherein the system is a microlithography projection exposure system.   
     
     
         55 . The system of  claim 54 , further comprising a holding element configured to hold the second optical corrective element in the holding frame. 
     
     
         56 . The system of  claim 55 , further comprising a manipulator configured to manipulate the second optical corrective element in the holding frame. 
     
     
         57 . The system of  claim 54 , further comprising a manipulator configured to manipulate the second optical corrective element in the holding frame. 
     
     
         58 . The system of  claim 54 , wherein the holding frame is replaceable. 
     
     
         59 . The system of  claim 54 , wherein the system is configured so that, when the second optical corrective element is replaced, the holding frame is not removed from the system. 
     
     
         60 . The system of  claim 54 , further comprising a device configured to hold the second optical corrective element after the second optical corrective element is replaced. 
     
     
         61 . The system of  claim 60 , further comprising a third optical corrective element, wherein:
 before replacement of the second optical corrective element:
 the second optical corrective element is held by the holding frame; and 
 the third optical corrective element is held by the device; and 
   after replacement of the second optical corrective element:
 the second optical corrective element is held by the device; and 
 the third optical corrective element is held by the holding frame. 
   
     
     
         62 . The system of  claim 61 , further comprising at least one additional optical corrective element held by the device. 
     
     
         63 . The system of  claim 60 , further comprising at least one additional optical corrective element held by the device. 
     
     
         64 . The system of  claim 60 , further comprising a mechanism to transport the second optical corrective element from the holder to the device. 
     
     
         65 . The system of  claim 60 , wherein the device comprises a magazine. 
     
     
         66 . The system of  claim 54 , wherein the first optical corrective element comprises a plane-parallel plate, and/or the second optical corrective element comprises a plane-parallel plate. 
     
     
         67 . The system of  claim 54 , wherein the first optical corrective element comprises a screen, and/or the second optical corrective element comprises a screen. 
     
     
         68 . The system of  claim 54 , wherein the first optical corrective element comprises an intensity filter, and/or the second optical corrective element comprises an intensity filter. 
     
     
         69 . The system of  claim 54 , wherein the second optical corrective element comprises a plane-parallel plate. 
     
     
         70 . The system of  claim 54 , further comprising a sensor unit configured to determine a position of the first optical corrective element. 
     
     
         71 . The system of  claim 54 , wherein an optically active surface of the first optical corrective element is a distance from a pupil plane of the system where a ratio of a principal beam height to a marginal beam height is greater than 0.75. 
     
     
         72 . A system, comprising:
 an illumination apparatus; and   a projection objective, comprising:
 a holding frame; 
 a first optical corrective element held by the holding frame; and 
 a second optical corrective element held by the holding frame so that the second optical corrective element is replaceable and so that the second optical corrective element is manipulable, 
   wherein:
 an optically active surface of the first optical corrective element is a distance from a pupil plane of the system where a ratio of a principal beam height to a marginal beam height is greater than 0.75; and 
 the system is a microlithography projection exposure system. 
   
     
     
         73 . An objective, comprising:
 a holding frame;   a first optical corrective element held by the holding frame; and   a second optical corrective element held by the holding frame so that the second optical corrective element is replaceable and so that the second optical corrective element is manipulable,   wherein:
 an optically active surface of the first optical corrective element is a distance from a pupil plane of the system where a ratio of a principal beam height to a marginal beam height is greater than 0.75; and 
 the objective is a microlithography projection objective. 
   
     
     
         74 . The objective of  claim 73 , further comprising a housing supporting the holding frame, wherein the objective is configured so that, when the second optical corrective element is replaced, the holding frame is not removed from the housing.