Inventor · disambiguated record
Paul F. Ma
Also filed as: MA PAUL · MA PAUL F
82 granted patents·41 pending applications·1,168 citations·filing 2005–2025
99Inventor score
Top patents by PatentIndex Score
123 records- 0198USRE47440EApparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2017·Granted Jun 18, 2019·360 cites·31 claims
- 0298US7780789B2Vortex chamber lids for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·458 cites·24 claims
- 0396US7682946B2Apparatus and process for plasma-enhanced atomic layer depositionAPPLIED MATERIALS INC·Filed 2006·Granted Mar 23, 2010·40 cites·33 claims
- 0495US12237171B1Method of forming vanadium nitride layer and structure including the vanadium nitride layerASM IP HOLDING BV·Filed 2023·Granted Feb 25, 2025·2 cites·10 claims
- 0595US11901175B2Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layerASM IP HOLDING BV·Filed 2022·Granted Feb 13, 2024·2 cites·18 claims
- 0695US7850779B2Apparatus and process for plasma-enhanced atomic layer depositionAPPLIED MATERISALS INC·Filed 2006·Granted Dec 14, 2010·69 cites·6 claims
- 0794US10014185B1Selective etch of metal nitride filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 3, 2018·22 cites·14 claims
- 0894US9048183B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 2, 2015·14 cites·18 claims
- 0994US7562672B2Chemical delivery apparatus for CVD or ALDAPPLIED MATERIALS INC·Filed 2006·Granted Jul 21, 2009·15 cites·16 claims
- 1093US12473641B2Apparatus for providing a gas mixture to a reaction chamber and method of using sameASM IP HOLDING BV·Filed 2022·Granted Nov 18, 2025·1 cites·14 claims
- 1193US8815344B2Selective atomic layer depositionsMA PAUL F·Filed 2012·Granted Aug 26, 2014·8 cites·20 claims
- 1291US11885013B2Method of forming vanadium nitride layer and structure including the vanadium nitride layerASM IP HOLDING BV·Filed 2020·Granted Jan 30, 2024·2 cites·24 claims
- 1391US10982326B2Counter-flow multi inject for atomic layer deposition chamberAPPLIED MATERIALS INC·Filed 2019·Granted Apr 20, 2021·3 cites·18 claims
- 1490US10431493B2Doping control of metal nitride filmsAPPLIED MATERIALS INC·Filed 2018·Granted Oct 1, 2019·5 cites·10 claims
- 1589US11424119B2Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layerASM IP HOLDING BV·Filed 2020·Granted Aug 23, 2022·2 cites·15 claims
- 1689US10487399B2Atomic layer deposition chamber with counter-flow multi injectAPPLIED MATERIALS INC·Filed 2015·Granted Nov 26, 2019·3 cites·20 claims
- 1789US9209074B2Cobalt deposition on barrier surfacesAPPLIED MATERIALS INC·Filed 2015·Granted Dec 8, 2015·5 cites·20 claims
- 1889US9032906B2Apparatus and process for plasma-enhanced atomic layer depositionMA PAUL·Filed 2007·Granted May 19, 2015·13 cites·20 claims
- 1989US8642468B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsGANGULI SESHADRI·Filed 2011·Granted Feb 4, 2014·9 cites·17 claims
- 2087US10043709B2Methods for thermally forming a selective cobalt layerAPPLIED MATERIALS INC·Filed 2015·Granted Aug 7, 2018·5 cites·19 claims
- 2187US9613859B2Direct deposition of nickel silicide nanowireAPPLIED MATERIALS INC·Filed 2015·Granted Apr 4, 2017·5 cites·19 claims
- 2287US8828866B1Methods for depositing a tantalum silicon nitride filmWEI GUODAN·Filed 2013·Granted Sep 9, 2014·11 cites·20 claims
- 2387US7833358B2Method of recovering valuable material from exhaust gas stream of a reaction chamberAPPLIED MATERIALS INC·Filed 2006·Granted Nov 16, 2010·17 cites·11 claims
- 2486US9748354B2Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereofAPPLIED MATERIALS INC·Filed 2016·Granted Aug 29, 2017·5 cites·20 claims
- 2586US9418890B2Method for tuning a deposition rate during an atomic layer deposition processMA PAUL·Filed 2014·Granted Aug 16, 2016·8 cites·25 claims
- 2684US9051641B2Cobalt deposition on barrier surfacesLU JIANG·Filed 2008·Granted Jun 9, 2015·8 cites·25 claims
- 2783US12241158B2Method for forming structures including transition metal layersASM IP HOLDING BV·Filed 2021·Granted Mar 4, 2025·1 cites·19 claims
- 2883US8491967B2In-situ chamber treatment and deposition processMA PAUL F·Filed 2008·Granted Jul 23, 2013·12 cites·2 claims
- 2983US7568495B2Chemical delivery apparatus for CVD or ALDAPPLIED MATERIALS INC·Filed 2007·Granted Aug 4, 2009·9 cites·20 claims
- 3082US7748400B2Chemical delivery apparatus for CVD or ALDAPPLIED MATERIALS INC·Filed 2009·Granted Jul 6, 2010·8 cites·25 claims
- 3181US9048294B2Methods for depositing manganese and manganese nitridesAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·6 cites·18 claims
- 3280US10752990B2Apparatus and methods to remove residual precursor inside gas lines post-depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·1 cites·16 claims
- 3380US10008412B2Doping control of metal nitride filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jun 26, 2018·2 cites·9 claims
- 3480US10002834B2Method and apparatus for protecting metal interconnect from halogen based precursorsAPPLIED MATERIALS INC·Filed 2015·Granted Jun 19, 2018·3 cites·20 claims
- 3579US12006572B2Reactor system including a gas distribution assembly for use with activated species and method of using sameASM IP HOLDING BV·Filed 2020·Granted Jun 11, 2024·1 cites·25 claims
- 3679US9109754B2Apparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2012·Granted Aug 18, 2015·4 cites·26 claims
- 3778US10109520B2Methods for depositing dielectric barrier layers and aluminum containing etch stop layersAPPLIED MATERIALS INC·Filed 2016·Granted Oct 23, 2018·2 cites·14 claims
- 3878US2025297359A1Method and system for depositing molybdenum layersASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 3977US10643840B2Selective deposition defects removal by chemical etchAPPLIED MATERIALS INC·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 4077US10608097B2Low thickness dependent work-function nMOS integration for metal gateAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·2 cites·17 claims
- 4176US11674220B2Method for depositing molybdenum layers using an underlayerASM IP HOLDING BV·Filed 2021·Granted Jun 13, 2023·0 cites·18 claims
- 4275US12351903B2Method and system for depositing molybdenum layersASM IP HOLDING BV·Filed 2023·Granted Jul 8, 2025·0 cites·11 claims
- 4375US10600685B2Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 24, 2020·2 cites·20 claims
- 4474US10950433B2Methods for enhancing selectivity in SAM-based selective depositionAPPLIED MATERIALS INC·Filed 2018·Granted Mar 16, 2021·1 cites·11 claims
- 4574US9659814B2Doping control of metal nitride filmsAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·2 cites·12 claims
- 4673US11587829B2Doping control of metal nitride filmsAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·0 cites·19 claims
- 4773US10665542B2Cobalt manganese vapor phase depositionAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·0 cites·20 claims
- 4873US9847289B2Protective via cap for improved interconnect performanceAPPLIED MATERIALS INC·Filed 2014·Granted Dec 19, 2017·2 cites·19 claims
- 4972US12472539B2Methods and apparatus for cleaning a vesselASM IP HOLDING BV·Filed 2023·Granted Nov 18, 2025·0 cites·11 claims
- 5072US10770292B2Wafer treatment for achieving defect-free self-assembled monolayersAPPLIED MATERIALS INC·Filed 2018·Granted Sep 8, 2020·1 cites·27 claims
Showing the top 50 of 123 patent records by PatentIndex Score.
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