Inventor · disambiguated record
Shiv Kumar Mishra
Also filed as: MISHRA SHIV K · MISHRA SHIV KUMAR
9 granted patents·2 pending applications·25 citations·filing 2014–2020
82Inventor score
Top patents by PatentIndex Score
11 records- 0189US9236269B2Field effect transistor (FinFET) device with a planar block area to enable variable Fin pitch and widthGLOBALFOUNDRIES INC·Filed 2014·Granted Jan 12, 2016·13 cites·20 claims
- 0288US10084093B1Low resistance conductive contactsGLOBALFOUNDRIES INC·Filed 2017·Granted Sep 25, 2018·6 cites·10 claims
- 0378US9419082B2Source/drain profile engineering for enhanced p-MOSFETGLOBALFOUNDRIES INC·Filed 2014·Granted Aug 16, 2016·4 cites·5 claims
- 0469US10236367B2Bipolar semiconductor device with silicon alloy region in silicon well and method for makingGLOBALFOUNDRIES INC·Filed 2017·Granted Mar 19, 2019·1 cites·20 claims
- 0567US10453747B2Double barrier layer sets for contacts in semiconductor deviceGLOBALFOUNDRIES INC·Filed 2017·Granted Oct 22, 2019·1 cites·17 claims
- 0666US11508810B2Diode structuresGLOBALFOUNDRIES INC·Filed 2020·Granted Nov 22, 2022·0 cites·20 claims
- 0757US10896953B2Diode structuresGLOBALFOUNDRIES INC·Filed 2019·Granted Jan 19, 2021·0 cites·19 claims
- 0850US11094822B1Source/drain regions for transistor devices and methods of forming sameGLOBALFOUNDRIES US INC·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims
- 0947US11239315B2Dual trench isolation structuresGLOBALFOUNDRIES US INC·Filed 2020·Granted Feb 1, 2022·0 cites·20 claims
- 1039US2019013402A1Field effect semiconductor device with silicon alloy region in silicon well and method for makingGLOBALFOUNDRIES INC·Filed 2017·Application pending·0 cites
- 1135US2018204929A1Metal gate formation using an energy removal filmGLOBALFOUNDRIES INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →