Inventor · disambiguated record
Chad Rue
Also filed as: RUE CHAD
28 granted patents·13 pending applications·116 citations·filing 2002–2024
95Inventor score
Top patents by PatentIndex Score
41 records- 0193US9064811B2Precursor for planar deprocessing of semiconductor devices using a focused ion beamFEI CO·Filed 2013·Granted Jun 23, 2015·12 cites·8 claims
- 0291US8455822B2Navigation and sample processing using an ion source containing both low-mass and high-mass speciesRUE CHAD·Filed 2011·Granted Jun 4, 2013·17 cites·21 claims
- 0389US11651924B1Method of producing microrods for electron emitters, and associated microrods and electron emittersFEI CO·Filed 2022·Granted May 16, 2023·1 cites·20 claims
- 0488US7119333B2Ion detector for ion beam applicationsIBM·Filed 2004·Granted Oct 10, 2006·34 cites·20 claims
- 0587US7351966B1High-resolution optical channel for non-destructive navigation and processing of integrated circuitsIBM·Filed 2006·Granted Apr 1, 2008·11 cites·20 claims
- 0683US9983152B1Material characterization using ion channeling imagingFEI CO·Filed 2016·Granted May 29, 2018·2 cites·16 claims
- 0782US8059918B2High accuracy beam placement for local area navigationYOUNG RICHARD J·Filed 2009·Granted Nov 15, 2011·8 cites·35 claims
- 0877US10190953B2Tomography sample preparation systems and methods with improved speed, automation, and reliabilityFEI CO·Filed 2017·Granted Jan 29, 2019·2 cites·20 claims
- 0976US10546719B2Face-on, gas-assisted etching for plan-view lamellae preparationFEI CO·Filed 2018·Granted Jan 28, 2020·2 cites·19 claims
- 1076US9443697B2Low energy ion beam etchFEI CO·Filed 2012·Granted Sep 13, 2016·3 cites·21 claims
- 1175US12488957B2Crenellated sample holder and sputter target for sample preparation in cryo electron microscopy applicationsFEI CO·Filed 2023·Granted Dec 2, 2025·0 cites·22 claims
- 1275US8358832B2High accuracy beam placement for local area navigationFEI CO·Filed 2011·Granted Jan 22, 2013·3 cites·20 claims
- 1374US8610092B2Charged particle beam processing system with visual and infrared imagingRUE CHAD·Filed 2011·Granted Dec 17, 2013·4 cites·16 claims
- 1472US2024429018A1Methods and systems for elemental mappingFEI CO·Filed 2024·Application pending·0 cites
- 1568US11798804B2Method of material depositionFEI CO·Filed 2020·Granted Oct 24, 2023·0 cites·15 claims
- 1668US7781733B2In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniquesIBM·Filed 2007·Granted Aug 24, 2010·2 cites·20 claims
- 1764US11735404B2Method, device and system for the treatment of biological cryogenic samples by plasma focused ion beamsFEI CO·Filed 2020·Granted Aug 22, 2023·0 cites·13 claims
- 1864US9087366B2High accuracy beam placement for local area navigationFEI CO·Filed 2014·Granted Jul 21, 2015·1 cites·24 claims
- 1962US6900137B2Dry etch process to edit copper linesIBM·Filed 2003·Granted May 31, 2005·10 cites·20 claims
- 2060US2023095798A1Methods and systems for elemental mappingFEI CO·Filed 2021·Application pending·0 cites
- 2159US11069523B2Method of material depositionFEI CO·Filed 2018·Granted Jul 20, 2021·0 cites·12 claims
- 2259US11062879B2Face-on, gas-assisted etching for plan-view lamellae preparationFEI CO·Filed 2019·Granted Jul 13, 2021·0 cites·20 claims
- 2357US2024222068A1Condensate precursors and contaminant purge apparatus and methodsFEI CO·Filed 2022·Application pending·0 cites
- 2456US8781219B2High accuracy beam placement for local area navigationWARSCHAUER REINIER LOUIS·Filed 2012·Granted Jul 15, 2014·1 cites·2 claims
- 2556US6946064B2Sample mount for performing sputter-deposition in a focused ion beam (FIB) toolIBM·Filed 2003·Granted Sep 20, 2005·3 cites·14 claims
- 2656US2025095959A1Delayering apparatus and methodsFEI CO·Filed 2023·Application pending·0 cites
- 2755US2025163571A1Carbon containing precursors for beam-induced depositionFEI CO·Filed 2023·Application pending·0 cites
- 2854US9978586B2Method of material depositionFEI CO·Filed 2016·Granted May 22, 2018·0 cites·16 claims
- 2953US9761467B2Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beamFEI CO·Filed 2015·Granted Sep 12, 2017·0 cites·20 claims
- 3051US10325754B2Ion implantation to alter etch rateFEI CO·Filed 2014·Granted Jun 18, 2019·0 cites·14 claims
- 3151US2019206664A1Method, device and system for the treatment of biological cryogenic samples by plasma focused ion beamsFEI CO·Filed 2018·Application pending·0 cites
- 3246US2017002467A1Adaptive control for charged particle beam processingFEI CO·Filed 2016·Application pending·0 cites
- 3344US2021118646A1Method for large-area 3d analysis of samples using glancing incidence fib millingFEI CO·Filed 2020·Application pending·0 cites
- 3441US6843893B2Metal dry etch using electronic fieldIBM·Filed 2002·Granted Jan 18, 2005·0 cites·13 claims
- 3538US2005016954A1System and methods of altering a very small surface areaIBM·Filed 2003·Application pending·0 cites
- 3638US2004060904A1Tool having a plurality of electrodes and corresponding method of altering a very small surfaceIBM·Filed 2002·Application pending·0 cites
- 3738US2005016952A1System and method of altering a very small surface area by multiple channel probeIBM·Filed 2003·Application pending·0 cites
- 3837US10347463B2Enhanced charged particle beam processes for carbon removalFEI CO·Filed 2016·Granted Jul 9, 2019·0 cites·13 claims
- 3935US10930514B2Method and apparatus for the planarization of surfacesFEI CO·Filed 2018·Granted Feb 23, 2021·0 cites·20 claims
- 4035US2006065853A1Apparatus and method for manipulating sample temperature for focused ion beam processingRUE CHAD·Filed 2004·Application pending·0 cites
- 4134US2004132287A1Dry etch process for copperIBM·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →