Inventor · disambiguated record
Peter Kurunczi
Also filed as: KURUNCZI PETER · KURUNCZI PETER L
9 granted patents·1 pending application·13 citations·filing 2010–2023
82Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT ASS INC6APPLIED MATERIALS INC1BATEMAN NICHOLAS1BATEMAN NICHOLAS P T1KURUNCZI PETER1
Top patents by PatentIndex Score
10 records- 0188US11402649B2System and method for optimally forming gratings of diffracted optical elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Aug 2, 2022·2 cites·16 claims
- 0287US11016228B2System and method for forming diffracted optical element having varied gratingsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted May 25, 2021·2 cites·20 claims
- 0385US10598832B2System and method for forming diffracted optical element having varied gratingsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Mar 24, 2020·4 cites·13 claims
- 0481US12099241B2Forming variable depth structures with laser ablationAPPLIED MATERIALS INC·Filed 2023·Granted Sep 24, 2024·0 cites·12 claims
- 0578US10795173B2System and method for optimally forming gratings of diffracted optical elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Oct 6, 2020·2 cites·20 claims
- 0675US10761334B2System and method for optimally forming gratings of diffracted optical elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Sep 1, 2020·2 cites·20 claims
- 0766US11442207B2System and method for forming diffracted optical element having varied gratingsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Sep 13, 2022·0 cites·19 claims
- 0864US8697559B2Use of ion beam tails to manufacture a workpieceBATEMAN NICHOLAS P T·Filed 2011·Granted Apr 15, 2014·1 cites·8 claims
- 0953US8450051B2Use of patterned UV source for photolithographyBATEMAN NICHOLAS·Filed 2010·Granted May 28, 2013·0 cites·15 claims
- 1042US2012295398A1Ion implant modification of resistive random access memory devicesKURUNCZI PETER·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →