Inventor · disambiguated record
Richard Parsons
Also filed as: PARSONS JR RICHARD E · PARSONS RICHARD · PARSONS RICHARD E
19 granted patents·12 pending applications·953 citations·filing 1980–2023
96Inventor score
Files withTOKYO ELECTRON LTD20GM GLOBAL TECH OPERATIONS INC1KITE MAGNETICS1PARSONS RICHARD1RP IDEAS PTY LTD1
Top patents by PatentIndex Score
31 records- 0198US6535785B2System and method for monitoring and controlling gas plasma processesTOKYO ELECTRON LTD·Filed 2001·Granted Mar 18, 2003·163 cites·18 claims
- 0298US6313584B1Electrical impedance matching system and methodTOKYO ELECTRON LTD·Filed 1998·Granted Nov 6, 2001·193 cites·53 claims
- 0397US6332961B1Device and method for detecting and preventing arcing in RF plasma systemsTOKYO ELECTRON LTD·Filed 1998·Granted Dec 25, 2001·147 cites·40 claims
- 0496US7164236B2Method and apparatus for improved plasma processing uniformityTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·66 cites·15 claims
- 0595US6351683B1System and method for monitoring and controlling gas plasma processesTOKYO ELECTRON LTD·Filed 1998·Granted Feb 26, 2002·105 cites·10 claims
- 0692US7102292B2Method and device for removing harmonics in semiconductor plasma processing systemsTOKYO ELECTRON LTD·Filed 2004·Granted Sep 5, 2006·38 cites·20 claims
- 0792US6884635B2Control of power delivered to a multiple segment inject electrodeTOKYO ELECTRON LTD·Filed 2002·Granted Apr 26, 2005·42 cites·17 claims
- 0889US6917204B2Addition of power at selected harmonics of plasma processor drive frequencyTOKYO ELECTRON LTD·Filed 2003·Granted Jul 12, 2005·65 cites·17 claims
- 0989US5382120ADrill bit depth minderFiled 1993·Granted Jan 17, 1995·62 cites·4 claims
- 1085US4360230ASelf locking coupling mechanism for engaging and moving a loadUS ENERGY·Filed 1980·Granted Nov 23, 1982·41 cites·18 claims
- 1183US11352677B2Method of producing soft magnetic materialTOYOTA MOTOR CO LTD·Filed 2017·Granted Jun 7, 2022·2 cites·6 claims
- 1263US7732227B2Method and apparatus for wall film monitoringTOKYO ELECTRON LTD·Filed 2006·Granted Jun 8, 2010·1 cites·12 claims
- 1363US2024186040A1Continuous ulta-rapid annealing of nanocrystalline soft magnetic materialsKITE MAGNETICS·Filed 2023·Application pending·0 cites
- 1461US7214289B2Method and apparatus for wall film monitoringTOKYO ELECTRON LTD·Filed 2002·Granted May 8, 2007·6 cites·36 claims
- 1559US7154256B2Integrated VI probeTOKYO ELECTRON LTD·Filed 2003·Granted Dec 26, 2006·9 cites·19 claims
- 1658US8000856B2Fuel door sensor diagnostic systems and methodsGM GLOBAL TECH OPERATIONS INC·Filed 2009·Granted Aug 16, 2011·4 cites·16 claims
- 1756US7158845B2Man-machine interface for monitoring and controlling a processTOKYO ELECTRON LTD·Filed 2002·Granted Jan 2, 2007·7 cites·29 claims
- 1850US2019075998A1Heavy duty washing apparatusRP IDEAS PTY LTD·Filed 2018·Application pending·0 cites
- 1948US7177781B2Method and system for electron density measurementTOKYO ELECTRON LTD·Filed 2003·Granted Feb 13, 2007·2 cites·42 claims
- 2046US10796612B1Vanity plate assemblyPARSONS RICHARD·Filed 2019·Granted Oct 6, 2020·0 cites·8 claims
- 2146US2022112587A1Iron Based AlloyUNIV MONASH·Filed 2020·Application pending·0 cites
- 2243US7216067B2Non-linear test load and method of calibrating a plasma systemTOKYO ELECTRON LTD·Filed 2003·Granted May 8, 2007·0 cites·13 claims
- 2343US2003137251A1Method and apparatus for improved plasma processing uniformityFiled 2003·Application pending·0 cites
- 2442US2005145334A1Method and apparatus for non-invasive measurement and analysis of semiconductor process parametersTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2542US2006021970A1Method and apparatus for non-invasive measurement and analysis of semiconductor process parametersTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2642US2005183821A1Method and apparatus for non-invasive measurement and analysis of semiconductor process parametersTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2740US2004250108A1Facility monitorFiled 2002·Application pending·0 cites
- 2839US2003084999A1Apparatus and method for mitigating chamber resonances in plasma processingTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 2939US2005231372A1Device for remote identification of partsTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3038US2003079983A1Multi-zone RF electrode for field/plasma uniformity control in capacitive plasma sourcesFiled 2002·Application pending·0 cites
- 3138US2004018127A1Wafer bias drive for plasma sourceTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
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