Inventor · disambiguated record
Albert E. Ozias
Also filed as: OZIAS ALBERT E
20 granted patents·3,023 citations·filing 1987–1995
97Inventor score
Top patents by PatentIndex Score
20 records- 0198US5374315ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentADVANCED SEMICONDUCTOR MAT·Filed 1993·Granted Dec 20, 1994·506 cites·27 claims
- 0298US4828224AChemical vapor deposition systemEPSILON TECHN INC·Filed 1987·Granted May 9, 1989·557 cites·2 claims
- 0397US5198034ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentEPSILON TECHN INC·Filed 1991·Granted Mar 30, 1993·279 cites·16 claims
- 0497US4836138AHeating system for reaction chamber of chemical vapor deposition equipmentEPSILON TECHN INC·Filed 1987·Granted Jun 6, 1989·166 cites·37 claims
- 0597US4821674ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentDEBOER WIEBE B·Filed 1987·Granted Apr 18, 1989·649 cites·31 claims
- 0695US4846102AReaction chambers for CVD systemsEPSILON TECHN INC·Filed 1987·Granted Jul 11, 1989·97 cites·39 claims
- 0794US4975561AHeating system for substratesEPSILON TECHN INC·Filed 1989·Granted Dec 4, 1990·98 cites·34 claims
- 0890US5657150AElectrochromic edge isolation-interconnect system, process, and device for its manufactureEYEONICS CORP·Filed 1994·Granted Aug 12, 1997·204 cites·58 claims
- 0990US5092728ASubstrate loading apparatus for a CVD processEPSILON TECHN INC·Filed 1989·Granted Mar 3, 1992·51 cites·7 claims
- 1087US5435682AChemical vapor desposition systemADVANCED SEMICONDUCTOR MAT·Filed 1994·Granted Jul 25, 1995·74 cites·10 claims
- 1185US5902407ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentFiled 1995·Granted May 11, 1999·61 cites·11 claims
- 1282US5427620ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentADVANCED SEMICONDUCTOR MAT·Filed 1992·Granted Jun 27, 1995·59 cites·32 claims
- 1377US5244694AApparatus for improving the reactant gas flow in a reaction chamberADVANCED SEMICONDUCTOR MAT·Filed 1991·Granted Sep 14, 1993·29 cites·4 claims
- 1476US5096534AMethod for improving the reactant gas flow in a reaction chamberEPSILON TECHN INC·Filed 1989·Granted Mar 17, 1992·24 cites·3 claims
- 1575US5261960AReaction chambers for CVD systemsEPSILON TECHN INC·Filed 1992·Granted Nov 16, 1993·26 cites·8 claims
- 1671US5117769ADrive shaft apparatus for a susceptorEPSILON TECHN INC·Filed 1990·Granted Jun 2, 1992·53 cites·13 claims
- 1770US4996942ARotatable substrate supporting susceptor with temperature sensorsEPSILON TECHN INC·Filed 1989·Granted Mar 5, 1991·36 cites·56 claims
- 1861US5044315AApparatus for improving the reactant gas flow in a reaction chamberEPSILON TECHN INC·Filed 1990·Granted Sep 3, 1991·15 cites·10 claims
- 1958US5318634ASubstrate supporting apparatusEPSILON TECHN INC·Filed 1991·Granted Jun 7, 1994·26 cites·14 claims
- 2045US4993355ASusceptor with temperature sensing deviceEPSILON TECHN INC·Filed 1989·Granted Feb 19, 1991·13 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →