Inventor · disambiguated record
Willem Herman Gertruda Anna Koenen
Also filed as: KOENEN WILLEM HERMAN G A · KOENEN WILLEM HERMAN GERTRUDA · KOENEN WILLEM HERMAN GERTRUDA ANNA
14 granted patents·2 pending applications·195 citations·filing 2004–2023
90Inventor score
Files withASML NETHERLANDS BV11KOENEN WILLEM HERMAN GERTRUDA ANNA2BUTLER HANS1COX HENRIKUS HERMAN MARIE1LOOPSTRA ERIK ROELOF1
Top patents by PatentIndex Score
16 records- 0195US7333174B2Lithographic apparatus and method for determining Z position errors/variations and substrate table flatnessASML NETHERLANDS BV·Filed 2005·Granted Feb 19, 2008·140 cites·25 claims
- 0289US9470988B2Substrate positioning system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Oct 18, 2016·10 cites·15 claims
- 0381US7889314B2Calibration methods, lithographic apparatus and patterning device for such lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Feb 15, 2011·8 cites·20 claims
- 0476US8174671B2Lithographic projection apparatus and method for controlling a support structureLOOPSTRA ERIK ROELOF·Filed 2008·Granted May 8, 2012·4 cites·38 claims
- 0575US7557903B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 7, 2009·4 cites·8 claims
- 0670US8451454B2Stage system, lithographic apparatus including such stage system, and correction methodKOENEN WILLEM HERMAN GERTRUDA ANNA·Filed 2008·Granted May 28, 2013·3 cites·16 claims
- 0768US7012672B2Lithographic apparatus, system, method, computer program, and apparatus for height map analysisASML NETHERLANDS BV·Filed 2004·Granted Mar 14, 2006·20 cites·36 claims
- 0867US8922756B2Position measurement system, lithographic apparatus and device manufacturing methodKOENEN WILLEM HERMAN GERTRUDA ANNA·Filed 2012·Granted Dec 30, 2014·2 cites·20 claims
- 0962US2025327653A1Method to determine an absolute position of a movable object, interferometer system, projection system and lithograpic apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1053US11774865B2Method of controlling a position of a first object relative to a second object, control unit, lithographic apparatus and apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 3, 2023·0 cites·20 claims
- 1150US9651877B2Position measurement system, grating for a position measurement system and methodASML NETHERLANDS BV·Filed 2013·Granted May 16, 2017·0 cites·19 claims
- 1247US9575416B2Lithographic apparatus, device manufacturing method and displacement measurement systemASML NETHERLANDS BV·Filed 2013·Granted Feb 21, 2017·0 cites·11 claims
- 1347US7756597B2Method of operating a lithographic processing machine, control system, lithographic apparatus, lithographic processing cell, and computer programASML NETHERLANDS BV·Filed 2004·Granted Jul 13, 2010·4 cites·20 claims
- 1442US8781775B2Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatusBUTLER HANS·Filed 2011·Granted Jul 15, 2014·0 cites·16 claims
- 1542US2006139595A1Lithographic apparatus and method for determining Z position errors/variations and substrate table flatnessASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 1637US8681316B2Measurement system, method and lithographic apparatusCOX HENRIKUS HERMAN MARIE·Filed 2011·Granted Mar 25, 2014·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →