Inventor · disambiguated record
Armin Werber
Also filed as: WERBER ARMIN
13 granted patents·37 citations·filing 2010–2016
88Inventor score
Top patents by PatentIndex Score
13 records- 0188US9411241B2Facet mirror for use in a projection exposure apparatus for microlithographyDINGER UDO·Filed 2010·Granted Aug 9, 2016·11 cites·27 claims
- 0287US8885143B2Projection exposure apparatus for microlithography for the production of semiconductor componentsFISCHER JUERGEN·Filed 2011·Granted Nov 11, 2014·7 cites·26 claims
- 0384US8767176B2Microlithographic projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jul 1, 2014·6 cites·30 claims
- 0482US9996012B2Facet mirror for use in a projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·2 cites·16 claims
- 0582US9523922B2Illumination system of a microlithographic projection exposure apparatus having a temperature control deviceZEISS CARL SMT GMBH·Filed 2014·Granted Dec 20, 2016·3 cites·21 claims
- 0675US9274434B2Light modulator and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Mar 1, 2016·2 cites·20 claims
- 0769US8797507B2Illumination system of a microlithographic projection exposure apparatus having a temperature control deviceBACH FLORIAN·Filed 2011·Granted Aug 5, 2014·2 cites·14 claims
- 0862US9013676B2Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithographyWERBER ARMIN·Filed 2011·Granted Apr 21, 2015·2 cites·24 claims
- 0959US8717531B2Mirror for guiding a radiation bundleWALDIS SEVERIN·Filed 2010·Granted May 6, 2014·1 cites·20 claims
- 1058US9535336B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 3, 2017·0 cites·22 claims
- 1158US9513562B2Projection exposure apparatus for microlithography for the production of semiconductor componentsZEISS CARL SMT GMBH·Filed 2014·Granted Dec 6, 2016·0 cites·29 claims
- 1254US8810805B2Light source for a sensor and a distance-measuring optoelectronic sensorSICK AG·Filed 2013·Granted Aug 19, 2014·1 cites·9 claims
- 1342US9025128B2Actuator including magnet for a projection exposure system and projection exposure system including a magnetWERBER ARMIN·Filed 2011·Granted May 5, 2015·0 cites·33 claims
Join the waitlist — get patent alerts
Get an alert when Armin Werber files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →