Inventor · disambiguated record
Edita Tejnil
Also filed as: TEJNIL EDITA
17 granted patents·2 pending applications·143 citations·filing 1998–2016
93Inventor score
Top patents by PatentIndex Score
19 records- 0183US6632576B2Optical assist feature for two-mask exposure lithographyINTEL CORP·Filed 2000·Granted Oct 14, 2003·19 cites·15 claims
- 0282US6506526B2Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelengthINTEL CORP·Filed 2001·Granted Jan 14, 2003·23 cites·28 claims
- 0371US9459523B2Pattern optical similarity determinationMENTOR GRAPHICS CORP·Filed 2014·Granted Oct 4, 2016·1 cites·21 claims
- 0471US7732106B2Methods for etching devices used in lithographyINTEL CORP·Filed 2008·Granted Jun 8, 2010·2 cites·18 claims
- 0569US8792147B2Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layoutTEJNIL EDITA·Filed 2007·Granted Jul 29, 2014·3 cites·18 claims
- 0669US8521481B2Method, program product and apparatus for modeling resist development of a lithography processTEJNIL EDITA·Filed 2007·Granted Aug 27, 2013·3 cites·15 claims
- 0769US7433791B2Method of performing multiple stage model calibration for optical imaging simulation modelsASML MASKTOOLS BV·Filed 2007·Granted Oct 7, 2008·2 cites·12 claims
- 0869US6972419B2Extreme ultraviolet radiation imagingINTEL CORP·Filed 2003·Granted Dec 6, 2005·9 cites·31 claims
- 0966US6774990B2Method to inspect patterns with high resolution photoemissionINTEL CORP·Filed 2002·Granted Aug 10, 2004·7 cites·85 claims
- 1064US6410193B1Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelengthINTEL CORP·Filed 1999·Granted Jun 25, 2002·36 cites·48 claims
- 1159US7033708B2Image focus monitor for alternating phase shift masksINTEL CORP·Filed 2003·Granted Apr 25, 2006·5 cites·21 claims
- 1256US7326501B2Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM)INTEL CORP·Filed 2003·Granted Feb 5, 2008·4 cites·16 claims
- 1355US9798226B2Pattern optical similarity determinationMENTOR GRAPHICS CORP·Filed 2016·Granted Oct 24, 2017·0 cites·20 claims
- 1455US6800406B2Method of generating optical assist features for two-mask exposure lithographyINTEL CORP·Filed 2003·Granted Oct 5, 2004·3 cites·6 claims
- 1552US6625800B1Method and apparatus for physical image based inspection systemINTEL CORP·Filed 1999·Granted Sep 23, 2003·15 cites·75 claims
- 1648US2010082313A1Optical Lithographic Process Model CalibrationTEJNIL EDITA·Filed 2009·Application pending·0 cites
- 1743US7438997B2Imaging and devices in lithographyINTEL CORP·Filed 2004·Granted Oct 21, 2008·0 cites·19 claims
- 1843US2004200572A1Assembling pellicle frames and photomasksFiled 2003·Application pending·0 cites
- 1941US6195169B1Phase-shifting point diffraction interferometer grating designsUNIV CALIFORNIA·Filed 1998·Granted Feb 27, 2001·11 cites·8 claims
Join the waitlist — get patent alerts
Get an alert when Edita Tejnil files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →