Assignee
TEJNIL EDITA
US·2 granted patents·1 pending application·6 citations·filing 2007–2009
Top patents by PatentIndex Score
3 records- 0169US8792147B2Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layoutTEJNIL EDITA·Filed 2007·Granted Jul 29, 2014·3 cites·18 claims
- 0269US8521481B2Method, program product and apparatus for modeling resist development of a lithography processTEJNIL EDITA·Filed 2007·Granted Aug 27, 2013·3 cites·15 claims
- 0348US2010082313A1Optical Lithographic Process Model CalibrationTEJNIL EDITA·Filed 2009·Application pending·0 cites
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