Inventor · disambiguated record
Stefan Carolus Jacobus Antonius Keij
Also filed as: KEIJ STEFAN CAROLUS JACOBUS A · KEIJ STEFAN CAROLUS JACOBUS AN · KEIJ STEFAN CAROLUS JACOBUS ANTONIUS
14 granted patents·4 pending applications·97 citations·filing 2004–2023
91Inventor score
Top patents by PatentIndex Score
18 records- 0194US7564555B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Jul 21, 2009·21 cites·19 claims
- 0292US7898662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Mar 1, 2011·13 cites·15 claims
- 0392US7532305B2Lithographic apparatus and device manufacturing method using overlay measurementASML NETHERLANDS BV·Filed 2006·Granted May 12, 2009·13 cites·11 claims
- 0491US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 0591US9223227B2Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing methodBHATTACHARYYA KAUSTUVE·Filed 2012·Granted Dec 29, 2015·16 cites·21 claims
- 0690US8064056B2Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterizationVAN DER SCHAAR MAURITS·Filed 2011·Granted Nov 22, 2011·6 cites·9 claims
- 0787US7440079B2Lithographic apparatus, alignment system, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 21, 2008·10 cites·50 claims
- 0884US11105619B2Measurement apparatusASML NETHERLANDS BV·Filed 2018·Granted Aug 31, 2021·3 cites·20 claims
- 0983US7692792B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Apr 6, 2010·6 cites·24 claims
- 1079US7391513B2Lithographic apparatus and device manufacturing method using overlay measurement quality indicationASML NETHERLANDS BV·Filed 2006·Granted Jun 24, 2008·5 cites·15 claims
- 1174US2024151520A1Measurement apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1271US11874103B2Measurement apparatusASML NETHERLANDS BV·Filed 2021·Granted Jan 16, 2024·0 cites·20 claims
- 1368US8264686B2Lithographic apparatus and device manufacturing method using overlay measurementDEN BOEF ARIE JEFFREY·Filed 2009·Granted Sep 11, 2012·2 cites·15 claims
- 1464US10705438B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Jul 7, 2020·0 cites·20 claims
- 1556US10571814B2Lithographic methodASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·0 cites·11 claims
- 1647US2009097008A1Alignment Method and Apparatus, Lithographic Apparatus, Metrology Apparatus and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 1743US2008036984A1Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1840US2006061743A1Lithographic apparatus, alignment system, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →