Inventor · disambiguated record
Chang Moon Lim
Also filed as: LIM CHANG MOON
17 granted patents·3 pending applications·50 citations·filing 1996–2024
90Inventor score
Top patents by PatentIndex Score
20 records- 0187US7303858B2Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 4, 2007·9 cites·26 claims
- 0279US7553771B2Method of forming pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Jun 30, 2009·7 cites·11 claims
- 0378US2024176226A1Method for fabricating euv mask and photomask using the euv maskSK HYNIX INC·Filed 2024·Application pending·0 cites
- 0473US7462439B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 9, 2008·3 cites·22 claims
- 0573US7381519B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 3, 2008·4 cites·22 claims
- 0671US7534548B2Polymer for immersion lithography and photoresist compositionHYNIX SEMICONDUCTOR INC·Filed 2005·Granted May 19, 2009·2 cites·18 claims
- 0769US7288364B2Top anti-reflective coating composition and method for pattern formation of semiconductor device using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Oct 30, 2007·3 cites·39 claims
- 0868US2022283488A1Euv mask and photomask fabricated by using the euv maskSK HYNIX INC·Filed 2021·Application pending·0 cites
- 0967US7915113B2Semiconductor device and method for manufacturing the sameHYNIX SEMICONDUCTOR INC·Filed 2008·Granted Mar 29, 2011·2 cites·10 claims
- 1058US7838201B2Method for manufacturing a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2009·Granted Nov 23, 2010·0 cites·18 claims
- 1157US8841219B2Lithography processes utilizing extreme ultraviolet rays and methods of manufacturing semiconductor devices using the samePARK JUN TAEK·Filed 2012·Granted Sep 23, 2014·1 cites·20 claims
- 1257US7571424B2Diffused aerial image model semiconductor device fabricationHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Aug 4, 2009·2 cites·3 claims
- 1357US5770338APhase shifting overlay mark that measures exposure energy and focusHYUNDAI ELECTRONICS IND·Filed 1996·Granted Jun 23, 1998·17 cites·9 claims
- 1450US9105655B2Semiconductor device and method for manufacturing the sameSK HYNIX INC·Filed 2012·Granted Aug 11, 2015·0 cites·10 claims
- 1550US8906584B2Photomask and method for forming pattern of semiconductor device using the sameSK HYNIX INC·Filed 2013·Granted Dec 9, 2014·0 cites·20 claims
- 1645US7629595B2Method for fabricating semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Dec 8, 2009·0 cites·4 claims
- 1745US2015311211A1Semiconductor device and method for manufacturing the sameSK HYNIX INC·Filed 2015·Application pending·0 cites
- 1844US9612524B2Reflective mask and method of fabricating the sameSK HYNIX INC·Filed 2015·Granted Apr 4, 2017·0 cites·20 claims
- 1940US7008734B2Phase shift maskHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Mar 7, 2006·0 cites·3 claims
- 2029US7419760B2Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the patternHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Sep 2, 2008·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →