Inventor · disambiguated record
Huixiong Dai
Also filed as: DAI HUIXIONG
44 granted patents·19 pending applications·152 citations·filing 2007–2025
97Inventor score
Files withAPPLIED MATERIALS INC51VARIAN SEMICONDUCTOR EQUIPMENT ASS INC8KIM EUI KYOON2CHEN HUI W1DAI HUIXIONG1
Top patents by PatentIndex Score
63 records- 0197US11908691B2Techniques to engineer nanoscale patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2022·Granted Feb 20, 2024·3 cites·7 claims
- 0297US11488823B2Techniques to engineer nanoscale patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2021·Granted Nov 1, 2022·4 cites·19 claims
- 0395US9761489B2Self-aligned interconnects formed using substractive techniquesAPPLIED MATERIALS INC·Filed 2013·Granted Sep 12, 2017·20 cites·2 claims
- 0494US11043380B2Techniques to engineer nanoscale patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jun 22, 2021·7 cites·10 claims
- 0594US9984889B2Techniques for manipulating patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted May 29, 2018·11 cites·17 claims
- 0693US9716012B2Methods of selective layer depositionAPPLIED MATERIALS INC·Filed 2014·Granted Jul 25, 2017·15 cites·18 claims
- 0792US10008384B2Techniques to engineer nanoscale patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jun 26, 2018·6 cites·16 claims
- 0892US9748148B2Localized stress modulation for overlay and EPEAPPLIED MATERIALS INC·Filed 2015·Granted Aug 29, 2017·8 cites·15 claims
- 0992US9411237B2Resist hardening and development processes for semiconductor device manufacturingAPPLIED MATERIALS INC·Filed 2014·Granted Aug 9, 2016·11 cites·18 claims
- 1091US10234772B2Overlay error correctionAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·5 cites·7 claims
- 1191US9478421B2Optically tuned hardmask for multi-patterning applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Oct 25, 2016·6 cites·13 claims
- 1289US11429026B2Lithography process window enhancement for photoresist patterningAPPLIED MATERIALS INC·Filed 2020·Granted Aug 30, 2022·2 cites·20 claims
- 1389US9177796B2Optically tuned hardmask for multi-patterning applicationsAPPLIED MATERIALS INC·Filed 2014·Granted Nov 3, 2015·7 cites·12 claims
- 1488US10643895B2Self-aligned interconnects formed using subtractive techniquesAPPLIED MATERIALS INC·Filed 2017·Granted May 5, 2020·5 cites·14 claims
- 1585US9728406B2Multi materials and selective removal enabled reverse tone processAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·4 cites·20 claims
- 1684US9343309B1Lateral oxidation process flowsAPPLIED MATERIALS INC·Filed 2015·Granted May 17, 2016·5 cites·15 claims
- 1783US8357618B2Frequency doubling using a photo-resist template maskAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·9 cites·20 claims
- 1881US11437284B2Contact over active gate structureAPPLIED MATERIALS INC·Filed 2019·Granted Sep 6, 2022·2 cites·17 claims
- 1980US10381232B2Techniques for manipulating patterned features using ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Aug 13, 2019·2 cites·17 claims
- 2076US10930555B2Contact over active gate structureAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·2 cites·20 claims
- 2176US9337051B2Method for critical dimension reduction using conformal carbon filmsAPPLIED MATERIALS INC·Filed 2015·Granted May 10, 2016·2 cites·19 claims
- 2275US2025347996A1Apparatus and method of patterning a substrate using an organoindium resistAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2374US12201030B2Spin-orbit torque MRAM structure and manufacture thereofAPPLIED MATERIALS INC·Filed 2023·Granted Jan 14, 2025·0 cites·3 claims
- 2474US7901869B2Double patterning with a double layer cap on carbonaceous hardmaskAPPLIED MATERIALS INC·Filed 2007·Granted Mar 8, 2011·4 cites·17 claims
- 2574US2024393695A1Photoresist patterning processAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2673US11880137B2Film structure for electric field guided photoresist patterning processAPPLIED MATERIALS INC·Filed 2023·Granted Jan 23, 2024·0 cites·20 claims
- 2772US9815091B2Roll to roll wafer backside particle and contamination removalAPPLIED MATERIALS INC·Filed 2014·Granted Nov 14, 2017·2 cites·20 claims
- 2870US11914299B2Lithography process window enhancement for photoresist patterningAPPLIED MATERIALS INC·Filed 2022·Granted Feb 27, 2024·0 cites·20 claims
- 2970US9864280B2Overlay error correctionAPPLIED MATERIALS INC·Filed 2015·Granted Jan 9, 2018·1 cites·16 claims
- 3069US12198985B2Contact over active gate structureAPPLIED MATERIALS INC·Filed 2022·Granted Jan 14, 2025·0 cites·11 claims
- 3169US10930556B2Contact over active gate structureAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·1 cites·23 claims
- 3268US8501395B2Line edge roughness reduction and double patterningDAI HUIXIONG·Filed 2008·Granted Aug 6, 2013·5 cites·20 claims
- 3367US12372874B2System architecture of manufacturing of semiconductor wafersAPPLIED MATERIALS INC·Filed 2022·Granted Jul 29, 2025·0 cites·13 claims
- 3467US10990014B2Performance improvement of EUV photoresist by ion implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Apr 27, 2021·0 cites·11 claims
- 3565US10825665B2Directional treatment for multi-dimensional device processingAPPLIED MATERIALS INC·Filed 2015·Granted Nov 3, 2020·1 cites·19 claims
- 3663US2024085810A1Vacuum bake for euv lithographyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3762US11723283B2Spin-orbit torque MRAM structure and manufacture thereofAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·0 cites·10 claims
- 3861US10545408B2Performance improvement of EUV photoresist by ion implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 28, 2020·0 cites·16 claims
- 3961US2025299964A1Pattern shaping of metal resist layer using reactive angled beam processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4060US12204246B2Metal oxide resist patterning with electrical field guided post-exposure bakeAPPLIED MATERIALS INC·Filed 2021·Granted Jan 21, 2025·0 cites·22 claims
- 4159US11650506B2Film structure for electric field guided photoresist patterning processAPPLIED MATERIALS INC·Filed 2019·Granted May 16, 2023·0 cites·15 claims
- 4259US8293460B2Double exposure patterning with carbonaceous hardmaskCHEN HUI W·Filed 2008·Granted Oct 23, 2012·2 cites·8 claims
- 4358US12085858B2Photoresist patterning processAPPLIED MATERIALS INC·Filed 2020·Granted Sep 10, 2024·0 cites·8 claims
- 4457US11313034B2Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor depositionAPPLIED MATERIALS INC·Filed 2017·Granted Apr 26, 2022·0 cites·11 claims
- 4557US2025253158A1Dry deposition of extreme ultraviolet (euv) underlayer for lithography and patterningAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4656US2024194540A1Two step implant to improve line edge roughness and line width roughnessAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4756US2024194541A1Two step implant to control tip-to-tip distance between trenchesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4855US11609505B2Apparatus and methods for verification and re-use of process fluidsAPPLIED MATERIALS INC·Filed 2021·Granted Mar 21, 2023·0 cites·21 claims
- 4953US2019212656A1PVD Films For EUV LithographyAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 5053US2025062123A1Treatments for thin films used in photolithographyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →